Bound-exciton absorption in Si:Al, Si:Ga, and Si:In

K. R. Elliott, G. C. Osbourn, D. L. Smith, and T. C. McGill
Phys. Rev. B 17, 1808 – Published 15 February 1978
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Abstract

We present high-resolution measurements of bound-exciton absorption for Si:Al, Si:Ga, and Si:In. In each case we observe at least three absorption lines due to the ground state and two excited states of the bound exciton. By comparing the measured no-phonon oscillator strengths for the three absorption lines with calculations of these quantities we establish that the triplet structure results from hole-hole coupling in the crystal field. We assign symmetry labels to the three states based on the observed oscillator strengths. We observed a small valley-orbit splitting of the lowest-energy line in Si:Al and absorption due to two highly excited states of the bound exciton in Si:In.

  • Received 5 August 1977

DOI:https://doi.org/10.1103/PhysRevB.17.1808

©1978 American Physical Society

Authors & Affiliations

K. R. Elliott, G. C. Osbourn, D. L. Smith, and T. C. McGill

  • California Institute of Technology, Pasadena, California 91125

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Issue

Vol. 17, Iss. 4 — 15 February 1978

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