Abstract
Electron detection at low energy range for scanning electron microscope (SEM), electron capture detector and electron probe micro-analysis (EPMA) applications, require detectors with high sensitivity and accuracy for low energy range. Such detectors must therefore have a thin entrance window and low recombination at the Si-SiO2 interface. An electron detector with 100% photons to electron-hole pair production rate having a 10 nm SiO2 passivating layer reveals a responsivity of approximately 0.25 A/W when irradiated. Simulations results showing the responsivity of electron interaction between detectors of varied interface fixed oxide charge density Qf show that there is an appreciable difference with the responsivity of a p+n detector and that of an n+p. The simulation results also show the significance of the effect of the minority carriers transport velocity Sn,p on the responsivity of the detector.