Abstract
Comparative study of titanium nitride deposition has been carried out, the growing coating being uninterruptedly bombarded by 100-eV ions or ions accelerated by high-voltage pulses applied to the substrate. The study revealed that microhardness of coatings synthesized using 25-kV pulses rises from 21 GPa to 29 GPa when percentage of nitrogen in the mixture with argon increases from 15% to 20%. With a further increase of nitrogen percentage to 30%, the microhardness slightly diminishes to 27 GPa. In contrast to golden coatings synthesized at low-voltage substrate biasing, the color of titanium nitride coating produced using high-voltage pulses is brown. The most striking difference of coating deposited using high-voltage pulses applied to the substrate is its perfect adhesion despite the interface formation at the room temperature without any preheating and activation. The adhesion characterization using a scratch-tester has revealed that critical loads of coatings synthesized using 25-kV pulses are several times higher than those of conventional nitride coatings synthesized at uninterrupted substrate biasing of 100 V. When the pulse amplitude diminishes to 5 kV, the critical loads and microhardness of the coating decrease to conventional values.
Export citation and abstract BibTeX RIS
Content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.