Abstract
The response of the ion current in the substrate region to the magnetic system configuration of a circular magnetron was studied during direct current sputtering of aluminum target. The unbalancing degree induced by changing of magnets' positions was modelled with finite element methods. The ion saturation current in the substrate region showed more than twofold variation with unbalancing degree in the range 0.6–1.2. The dependence was non-monotonic, and the system was optimized to maximize the substrate ion current. The Langmuir probe diagnostics showed plasma density ~ 1016 m−3 in the optimized magnetic configuration.
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