Paper

A new curvature compensation technique for CMOS voltage reference using |VGS| and ΔVBE*

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© 2016 Chinese Institute of Electronics
, , Citation Xuemin Li et al 2016 J. Semicond. 37 055005 DOI 10.1088/1674-4926/37/5/055005

1674-4926/37/5/055005

Abstract

A new mixed curvature compensation technique for CMOS voltage reference is presented, which resorts to two sub-references with complementary temperature characteristics. The first sub-reference is the source–gate voltage |VGS|p of a PMOS transistor working in the saturated region. The second sub-reference is the weighted sum of gate–source voltages |VGS|n of NMOS transistors in the subthreshold region and the difference between two base–emitter voltages ΔVBE of bipolar junction transistors (BJTs). The voltage reference implemented utilizing the proposed curvature compensation technique exhibits a low temperature coefficient and occupies a small silicon area. The proposed technique was verified in 0.18 μm standard CMOS process technology. The performance of the circuit has been measured. The measured results show a temperature coefficient as low as 12.7 ppm/°C without trimming, over a temperature range from −40 to 120 °C, and the current consumption is 50 μA at room temperature. The measured power-supply rejection ratio (PSRR) is −31.2 dB @ 100 kHz. The circuit occupies an area of 0.045 mm2.

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Footnotes

  • Project supported by the National Natural Science Foundation of China (No. 61376032).