Abstract
The authors describe an ultra-high-vacuum experimental apparatus, based on a gas phase technique, mainly dedicated to hydrogen permeation studies of thin films deposited on metallic substrates. The apparatus is also provided with a sample holder and a heating system for thermal desorption spectroscopy. Calibration and measurement procedures are described. To prove the efficiency of the new apparatus some experiments concerning hydrogen permeation through amorphous SiC film deposited on steel and thermal desorption of Kr ions implanted into Ti films are illustrated.
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