Mist plasma evaporation (MPE) technique has been developed to deposit (BST) thin films on and substrates at atmospheric pressure using metal nitrate aqueous solution as precursor. MPE is characterized by the injection of liquid reactants into thermal plasma where the source materials in the droplets are evaporated by the high temperature of the thermal plasma. Nanometer-scale clusters are formed in the tail flame of the plasma, and then deposited and rearranged on the substrate at a lower temperature. Due to the high temperature annealing process of the thermal plasma before deposition, well-crystallized BST films were deposited at substrate temperature of . The dielectric constant and dielectric loss of the film at are 715 and 0.24, respectively. Due to the good crystallinity of the BST films deposited by MPE, high dielectric tunability up to 39.3% is achieved at low applied electric field of .
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1 June 2006
Research Article|
June 07 2006
Dielectric properties of thin films deposited by mist plasma evaporation using aqueous solution precursor
Hui Huang;
Hui Huang
a)
Electronic Materials Research Laboratory,
Xi’an Jiaotong University
, Xi’an 710049, China
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Peng Shi;
Peng Shi
Electronic Materials Research Laboratory,
Xi’an Jiaotong University
, Xi’an 710049, China
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Minqiang Wang;
Minqiang Wang
Electronic Materials Research Laboratory,
Xi’an Jiaotong University
, Xi’an 710049, China
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Xi Yao;
Xi Yao
Electronic Materials Research Laboratory,
Xi’an Jiaotong University
, Xi’an 710049, China
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O. K. Tan
O. K. Tan
Microelectronics Center, School of EEE,
Nanyang Technological University
, 639798 Singapore, Singapore
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a)
Author to whom correspondence should be addressed; present address: Sensors and Actuators Lab, Microelectronics Center, School of EEE, Nanyang Technological University, 639798, Singapore; electronic mail: hhuang@ntu.edu.sg
J. Appl. Phys. 99, 114105 (2006)
Article history
Received:
May 20 2005
Accepted:
April 19 2006
Citation
Hui Huang, Peng Shi, Minqiang Wang, Xi Yao, O. K. Tan; Dielectric properties of thin films deposited by mist plasma evaporation using aqueous solution precursor. J. Appl. Phys. 1 June 2006; 99 (11): 114105. https://doi.org/10.1063/1.2203734
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