Issue 14, 2023

Two-dimensional layered Dion–Jacobson phase organic–inorganic tin iodide perovskite field-effect transistors

Abstract

Two-dimensional (2D) layered Dion–Jacobson (D–J) phase organic–inorganic Sn-based perovskites show potential applications in field-effect transistors, similar to their Ruddlesden–Popper (R–P) counterparts; however, they have not attracted sufficient attention. In this work, we report on the investigations of 1,4-butanediamine tin iodide perovskite (BDASnI4) and the demonstration of polymer-bottom-gated BDASnI4 thin film field-effect transistors. First-principles calculations reveal that BDASnI4 possesses a 2D layered D–J structure with small lattice distortions, which facilitates in-plane charge transport in the [SnI6]4− frameworks. Theoretical results and physical characteristics prove that the single BDA2+ layer eliminates the van der Waals gap in R–P perovskites, resulting in enhanced structural stability and a reduced quantum well effect. More importantly, the strong interlayer electronic coupling through the shortened apical I–I interactions improves the out-of-plane charge transport in BDASnI4, which is regarded as a limitation for 2D R–P perovskites. BDASnI4 transistors exhibit p-type high-performance with enhanced operating stability under ambient conditions. The hole mobility achieved in the champion device is 0.58 cm2 V−1 s−1, approaching that of amorphous silicon. Our work provides theoretical and experimental bases for developing 2D layered D–J phase perovskites for field-effect transistors.

Graphical abstract: Two-dimensional layered Dion–Jacobson phase organic–inorganic tin iodide perovskite field-effect transistors

Supplementary files

Article information

Article type
Paper
Submitted
05 Jan 2023
Accepted
13 Mar 2023
First published
14 Mar 2023

J. Mater. Chem. A, 2023,11, 7767-7779

Two-dimensional layered Dion–Jacobson phase organic–inorganic tin iodide perovskite field-effect transistors

H. Ji, X. Liu, L. Li, F. Zhang, L. Qin, Z. Lou, D. Li, Y. Hu, Y. Hou and F. Teng, J. Mater. Chem. A, 2023, 11, 7767 DOI: 10.1039/D3TA00084B

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