Superior light-resistant dithieno[3,2-b:2′,3′-d]arsole-based polymers exhibiting ultrastable amplified spontaneous emission

Chieko Yamazawa; Yoshinori Hirano; Hiroaki Imoto; Naoto Tsutsumi; Kensuke Naka

doi:10.1039/D0CC07521C

You do not have JavaScript enabled. Please enable JavaScript to access the full features of the site or access our non-JavaScript page.

Superior light-resistant dithieno[3,2-b:2′,3′-d]arsole-based polymers exhibiting ultrastable amplified spontaneous emission†

Chieko Yamazawa,^a Yoshinori Hirano,^b Hiroaki Imoto,

^ac Naoto Tsutsumi

*^d and Kensuke Naka

*^ac

Author affiliations

* Corresponding authors

^a Faculty of Molecular Chemistry and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Goshokaido-cho, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan
E-mail: kenaka@kit.ac.jp

^b Department of Macromolecular Science and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Goshokaido-cho, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan

^c Materials Innovation Lab, Kyoto Institute of Technology, Goshokaido-cho, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan

^d Faculty of Materials Science and Engineering, Graduate School of Science and Technology, Kyoto Institute of Technology, Goshokaido-cho, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan
E-mail: tsutsumi@kit.ac.jp

Abstract

Herein, by amplified spontaneous emission measurements, dithieno[3,2-b:2′,3′-d]arsole (DTA)-bithiophene (DTA-BT) and DTA-ethynylbenzene (DTA-EB) polymer films exhibited considerable photostability under continuous pulsed pumping excitation for at least 15 h at the pumping energies, 28.9 and 20.7 μJ, respectively, showing an outstanding high light-resistance among the polymer-based gain media.

Download options Please wait...

Supplementary files

Supplementary information PDF (1677K)

Article information

DOI: https://doi.org/10.1039/D0CC07521C
Article type: Communication
Submitted: 16 Nov 2020
Accepted: 18 Jan 2021
First published: 18 Jan 2021

Download Citation

Chem. Commun., 2021,57, 1595-1598

Permissions

Request permissions

Superior light-resistant dithieno[3,2-b:2′,3′-d]arsole-based polymers exhibiting ultrastable amplified spontaneous emission

C. Yamazawa, Y. Hirano, H. Imoto, N. Tsutsumi and K. Naka, Chem. Commun., 2021, 57, 1595 DOI: 10.1039/D0CC07521C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Social activity

Fetching data from CrossRef.
This may take some time to load.

Chemical Communications

Superior light-resistant dithieno[3,2-b:2′,3′-d]arsole-based polymers exhibiting ultrastable amplified spontaneous emission†

Abstract

Supplementary files

Article information

Download Citation

Permissions

Superior light-resistant dithieno[3,2-b:2′,3′-d]arsole-based polymers exhibiting ultrastable amplified spontaneous emission

Social activity

Search articles by author

Spotlight

Advertisements