Issue 10, 2011

Synthesis of diblock copolymers bearing p-methoxyphenacyl side groups

Abstract

This contribution reports on the synthesis of light-responsive diblock copolymers containing para-methoxyphenacyl photocleavable side groups. The synthetic strategy consists in the direct polymerization of p-methoxyphenacyl methacrylate by Atom Transfer Radical Polymerization. Several catalytic systems have been screened to synthesize poly(p-methoxyphenacyl methacrylate) in a controlled way. In a second step, diblock copolymers containing a poly(p-methoxyphenacyl methacrylate) block and a block composed of either polystyrene, poly(tert-butyl acrylate) or poly(methyl methacrylate) have been synthesized to evidence the possibility of preparing copolymers with monomers belonging to the three main categories. The cleavage of the p-methoxyphenacyl moieties in solution has been finally demonstrated.

Graphical abstract: Synthesis of diblock copolymers bearing p-methoxyphenacyl side groups

Article information

Article type
Paper
Submitted
04 May 2011
Accepted
05 Jun 2011
First published
08 Jul 2011

Polym. Chem., 2011,2, 2284-2292

Synthesis of diblock copolymers bearing p-methoxyphenacyl side groups

O. Bertrand, J. Gohy and C. Fustin, Polym. Chem., 2011, 2, 2284 DOI: 10.1039/C1PY00194A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements