Novel anionic photoacid generators (PAGs) and corresponding PAG bound polymers for sub-50 nm EUV lithography
Abstract
A new series of anionic photoacid generators (PAGs) and corresponding
* Corresponding authors
a
Polymer Nanotechnology Laboratory at Center for Optoelectronic and Optical Communications & Department of Chemistry, University of North Carolina, Charlotte, North Carolina, USA
E-mail:
kegonsal@email.uncc.edu
b Intel Corp., Hillsboro, OR, USA
A new series of anionic photoacid generators (PAGs) and corresponding
M. Wang, K. E. Gonsalves, M. Rabinovich, W. Yueh and J. M. Roberts, J. Mater. Chem., 2007, 17, 1699 DOI: 10.1039/B617133H
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