Issue 8, 2006
From the journal:

Chemical Communications

Mesoporous silicon oxynitride thin films†

Jiacheng Wangab  and  Qian Liu*a  

* Corresponding authors

a State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, 1295 Dingxi Road, Shanghai 200050, P. R. China
E-mail: qianliu@sunm.shcnc.ac.cn
Fax: (+86) 21 5241 3122
Tel: (+86) 21 5241 2612

b Graduate School of the Chinese Academy of Sciences, 19A Yuquan Road, Beijing 100039, P. R. China

Abstract

Highly-ordered, pore-modified with amine groups, and glasslike mesoporous silicon oxynitride thin films were prepared by heat treatment of as-synthesized mesoporous silica thin films in a flowing ammonia environment at high temperatures.

Graphical abstract: Mesoporous silicon oxynitride thin films

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Article information

DOI
https://doi.org/10.1039/B513854J
Article type
Communication
Submitted
29 Sep 2005
Accepted
15 Dec 2005
First published
19 Jan 2006

Chem. Commun., 2006, 900-902

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Mesoporous silicon oxynitride thin films

J. Wang and Q. Liu, Chem. Commun., 2006, 900 DOI: 10.1039/B513854J

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