Issue 20, 2009
From the journal:

Journal of Materials Chemistry

Selective metal deposition for a structure with a thin intermediate layer on a photochromic diarylethene film

Kyoko Masui,a   Rie Takagi,a   Yusuke Sesumi,a   Shinichiro Nakamurab  and  Tsuyoshi Tsujioka*a  

* Corresponding authors

a Osaka Kyoiku University, CREST Japan Science and Technology Agency, Asahigaoka 4-698-1, Kashiwara, Osaka, Japan

b Mitsubishi Chemical Group Science and Technology Research Center Inc, CREST Japan Science and Technology Agency, Kamoshida 1000, Aoba-ku Yokohama, Kanagawa, Japan

Abstract

Selective metal Mg deposition was achieved for a structure with the 8-nm-thick intermediate layer of Alq3 on a photochromic diarylethene (DAE) layer. Selective deposition for a structure with the Alq3 intermediate layer was attributed to uncolored DAE molecules exposed on the surface due to the migration and the aggregation of Alq3 molecules on the uncolored DAE layer. Laser spot irradiation enables both isomerization and an annealing effect on samples with an Alq3 intermediate layer, thereby achieving selective Mg deposition. Selective deposition for a structure with an intermediate layer could be important for the preparation of patterned cathodes in the field of organic electronics.

Graphical abstract: Selective metal deposition for a structure with a thin intermediate layer on a photochromic diarylethene film

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Article information

DOI
https://doi.org/10.1039/B820408J
Article type
Paper
Submitted
14 Nov 2008
Accepted
04 Mar 2009
First published
31 Mar 2009

J. Mater. Chem., 2009,19, 3176-3180

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Selective metal deposition for a structure with a thin intermediate layer on a photochromic diarylethene film

K. Masui, R. Takagi, Y. Sesumi, S. Nakamura and T. Tsujioka, J. Mater. Chem., 2009, 19, 3176 DOI: 10.1039/B820408J

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