Issue 4, 2004
From the journal:

Lab on a Chip

Characterization of molecular transport in poly(dimethylsiloxane) microchannels for electrophoresis fabricated with synchrotron radiation-lithography and UV-photolithography

Bi-Feng Liu,*ab   Motoaki Ozaki,b   Hideaki Hisamoto,b   Yuichi Utsumi,c   Tadashi Hattoric  and  Shigeru Terabeb  

* Corresponding authors

a The Key Laboratory of Biomedical Photonics of Ministry of Education, Huazhong University of Science and Technology, Wuhan 430074, P.R. China

b Graduate School of Science, Kamigori, Hyogo 678-1297, Japan

c Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology, Kamigori, Hyogo 678-1297, Japan

Abstract

In the present paper, a study was undertaken of molecular transport in ploy(dimethylsiloxane) microchannels that were fabricated by ultraviolet (UV)-photolithography and synchrotron radiation (SR)-lithography characterized and compared for microchip capillary electrophoresis by evaluating in-channel molecular dispersion. A fluorescent tag, sulforhodamine B was used as the probing molecule. It was found that microchannels made by SR-lithography fabrication were superior to those made by UV-photolithography fabrication in terms of molecular transport performance. A deep insight into surface conditions characterized by scanning electron microscopy suggested it was related to the difference in surface roughness. Chromatographic retention in electropherograms further supported such a conclusion, which depended on the phase ratio of the channel surface. The results revealed for PDMS microchannels in this work were in good agreement with the phenomenon found for glass microchannels in the literature.

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Article information

DOI
https://doi.org/10.1039/B315674E
Article type
Paper
Submitted
03 Dec 2003
Accepted
20 Feb 2004
First published
31 Mar 2004

Lab Chip, 2004,4, 368-371

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Characterization of molecular transport in poly(dimethylsiloxane) microchannels for electrophoresis fabricated with synchrotron radiation-lithography and UV-photolithography

B. Liu, M. Ozaki, H. Hisamoto, Y. Utsumi, T. Hattori and S. Terabe, Lab Chip, 2004, 4, 368 DOI: 10.1039/B315674E

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