Ion flux and deposition rate measurements made in plasmas of acrylic acid support the view that at low plasma power ions are primarily responsible for deposit growth.
A. J. Beck, R. M. France, A. M. Leeson, R. D. Short, R. M. France, A. Goodyear and N. St. J. Braithwaite, Chem. Commun., 1998, 1221 DOI: 10.1039/A801778F
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