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Chemical structure modification of silicone surfaces by plasma immersion ion implantation

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Plasma Science and Microelectronics Laboratory, Department of Electrical and Computer Engineering, Northeastern University, Boston, MA, 02115, USA

    I. F. Husein

  2. Plasma Science and Microelectronics Laboratory, Department of Electrical and Computer Engineering, Northeastern University, Boston, MA, 02115, USA

    Chung Chan

  3. Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee, Kowloon, Hong Kong, People's Republic of China

    P. K. Chu

Authors
  1. I. F. Husein
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  2. Chung Chan
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  3. P. K. Chu
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Husein, I.F., Chan, C. & Chu, P.K. Chemical structure modification of silicone surfaces by plasma immersion ion implantation. Journal of Materials Science Letters 19, 1883–1885 (2000). https://doi.org/10.1023/A:1006774308291

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