Abstract
Electrochemical experiments were performed to study the inhibitive effect towards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most significant inhibitive effect towards pitting. However, impedance measurements revealed that this compound produced a thinning of the passive film. This was corroborated by X-ray photoelectron spectroscopy. Results showed that copper pitting resistance could not be explained only by characterizing the protectiveness of the passive film.
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References
W. Qafsaoui, G. Mankowski, P. Leterrible and F. Dabosi, Proceedings of the International Congress on 'Control of Copper and Copper Alloys Oxidation', Rouen, France (1992) and Revue de Métallurgie, série 6 (1992), p. 63.
P.E. Francis, W.K. Cheung and R.C. Pemberton, Proc. 11th Int. Corr. Cong., Florence, Italy, Ed. Associazione Italiana di Metallurgia, Vol. 5 (1990), p. 363.
J.P. Duthil, G. Mankowski and A. Giusti, Corros. Sci. 38 (1996) 1839.
T. Shibata and T. Takeyama, Corrosion 33 (1977) 243.
W. Qafsaoui, G. Mankowski and F. Dabosi, Corros. Sci. 34 (1993) 17.
R. Walker, Corrosion 29 (1973) 290.
R. Babic, M. Meticos-Hukovic and M. Loncar, Electrochim. Acta 44 (1999) 2413.
S. Ferina, M. Loncar and M. Meticos-Hukovic, Proceedings of the 8th Symposium on 'Corrosion Inhibitors', Ferrara, Italy (1995), p. 1065.
F. Chaouket, A. Srhiri, A. Ben Bachir and A. Frignani, Proceedings op. cit. [8], p. 1031.
C. Fiaud, Proceedings op. cit. [8], p. 929.
J.B. Cotton and I.R. Scholes, Br. Corr. J. 2 (1967) 1.
G.W. Poling, Corros. Sci. 10 (1970) 359.
F. El-Taib Heakal and S. Haruyama, Corros. Sci. 20 (1980) 887.
D. Tromans, J. Electrochem. Soc. 145 (1998) L42.
P.G. Fox, G. Lewis and P.J. Boden, Corros. Sci. 19 (1979) 457.
R. Youda, H. Nishihara and K. Aramaki, Electrochim. Acta 35 (1990) 1011.
G. Xue, J. Ding, P. Lu and J. Dong, J. Phys. Chem. 95 (1991) 7380.
D. Chadwick and T. Hashemi, Corros. Sci. 18 (1978) 39.
C. Tornkvist, D. Thiery, J. Bergman, B. Liedberg and C. Leygraf, J. Electrochem. Soc. 136 (1989) 58.
I.C.G. Ogle and G.W. Poling, Can. Met. Quartely 14 (1975) 37.
Chen Jin-Hua, Lin Zhi-Cheng, Chen Shu, Nie Li-Hua and Yao Shou-Zhuo, Electrochim. Acta 43 (1998) 265.
A. Laachach, M. Aouial, A. Srhiri and A. Ben Bachir, J. Chim. Phys. 89 (1992) 2011.
Y. Feng, W.K. Teo, K.S. Siow, K.L. Tan and A.K. Hsieh, Corros. Sci. 38 (1996) 369.
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Qafsaoui, W., Blanc, C., Pébère, N. et al. Study of different triazole derivative inhibitors to protect copper against pitting corrosion. Journal of Applied Electrochemistry 30, 959–966 (2000). https://doi.org/10.1023/A:1004056527379
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DOI: https://doi.org/10.1023/A:1004056527379