Abstract
The nucleation and growth of diamond coatings on pure Ti substrate were investigated using microwave plasma assisted chemical vapor deposition (MW-PACVD) method. The effects of hydrogen plasma, plasma power, gas pressure and gas ratio of CH4 and H2 on the microstructure and mechanical properties of the deposited diamond coatings were evaluated. Results indicated that the nucleation and growth of diamond crystals on Ti substrate could be separated into different stages: (1) surface etching by hydrogen plasma and the formation of hydride; (2) competition between the formation of carbide, diffusion of carbon atoms and diamond nucleation; (3) growth of diamond crystals and coatings on TiC layer. During the deposition of diamond coatings, hydrogen diffused into Ti substrate forming titanium hydride and led to a profound microstructure change and a severe loss in impact strength. Results also showed that pre-etching of titanium substrate with hydrogen plasma for a short time significantly increased the nuclei density of diamond crystals. Plasma power had a significant effect on the surface morphology and the mechanical properties of the deposited diamond coatings. The effects of gas pressure and gas ratio of CH4 and H2 on the nucleation, growth and properties of diamond coatings were also studied. A higher ratio of CH4 during deposition increased the nuclei density of diamond crystals but resulted in a poor and cauliflower coating morphology. A lower ratio of CH4 in the gas mixture produced a high quality diamond crystals, however, the nuclei density and the growth rate decreased dramatically.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
S. Sivakumar, K. Suresh, K. Dhanadurai and S. Rajeswari, J. Mater. Sci. Lett. 14(1995) 351–354.
J. B. Park, “Biomaterials Science and Engineering” (Plenum, New York, 1984) pp. 193–233.
K. E. Budinski, Wear 151(1991) 203–217.
N. A. Morrison, I. C. Drumond and C. Garth, Diamond and Related Materials 5 (1996) 1118–1126.
G. Heinrich, T. Grogler, S. M. Rosiwal and R. F. Singer, Surface and Coatings Technology 94/95 (1997) 514–520.
E. Mitura, A. Niedzielska, P. Niedielski, L. Klimek, A. Rylki, S. Mitura, J. Moll and W. Pietrzykowski, Diamond and Related Materials 5 (1996) 998–1001.
W. D. Fan, K. Jagannadham and J. Narayan, Surface and Coatings Technology 91 (1997) 32–36.
D. Rats, L. Vandenbulcke, C. Boher and G. Farges, ibid. 94/95 (1997) 555–560.
A. P. Dementjev and M. N. Petukhov, Diamond and Related Materials 6 (1997) 486–489.
R. Beckmann, S. Reinke, M. Kuhr, W. Kulisch and R. Kassing, Surface and Coatings Technology 60 (1993) 506–510.
D. S. Shih, I. M. Robertson and H. K. Birnbaum, Acta Metall. 36 (1988) 111–124.
H. Numakura and M. Koiwa, ibid. 32 (1984) 1799–1807.
R. E. Shroder, R. J. Nemanich and J. T. Glass, Phys. Rev. B41 (1990) 3738.
W. Wang, K. Liao, J. Gao and A. Liu, Thin Solid Films 215 (1992) 174–178.
Y. Nakamura, S. Sakagami, Y. Amamoto and Y. Watanabe, ibid. 308/309 (1997) 249–253.
M. Ihara, H. Komiyama and T. Okubo, Appl. Phys. Lett. 65(9) (1994) 1192.
H. Liu and D. S. Dandy, Diamond and Related Materials 4 (1995) 1173–1188.
M. Frenklach and H. Wang, Phys. Rev. B43 (1991) 1520.
R. Beckman, S. Reinke, M. Kuhr, W. Kulisch and R. Kassing, Surface and Coatings Technology 60 (1993) 506.
S. S. Park and J. Y. Le, J. Appl. Phys. 69 (1991) 2618–2633.
G. E. Dieter, “Mechanical Metallurgy” (McGraw-Hill, New York, 1986).
T. M. de Souza, N. F. Leite, V. J. Travaairoldi and E. J. Corat, Thin Solid Films 308/309 (1997) 254–257.
F. Silva, A. Gicquel, A. Tardieu, P. Cledat and T. Chauveau, Diamond and Related Materials 5 (1996) 338–344.
X. L. Peng and T. W. Clyne, Thin Solid Films 293 (1997) 261–269.
C. R. Shi, Y. Avyigal, S. Dirnfield, A. Hoffman, A. Fayer and R. Kalish, Diamond and Related Materials 4(1995) 1079–1087.
J. W. Kim, Y. J. Baik and K. Y. Eun, ibid. 1(1992) 200–204.
G. Heinrich, T. Grogler, S. M. Rosiwal, R. F. Singer, R. Stockel and L. Ley, ibid. 5(1996) 304–307.
J. C. Angus and C. C. Hayman, Science 24(1988) 913.
J. Gunnars and A. Alahelisten, Surface and Coatings Technology 80(1996) 303–312.
W. D. Fan, H. Wu, K. Jagannadham and B. C. Goral, ibid. 72(1995) 78–87.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Fu, Y., Yan, B., Loh, N.L. et al. Deposition of diamond coating on pure titanium using micro-wave plasma assisted chemical vapor deposition. Journal of Materials Science 34, 2269–2283 (1999). https://doi.org/10.1023/A:1004569406535
Issue Date:
DOI: https://doi.org/10.1023/A:1004569406535