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High-quality epitaxial TiO2 thin films grown on α-Al2O3 substrates by pulsed laser deposition

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Quantum Engineering and Systems Science, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan

    R. Shinohara & K. Asai

  2. Department of Materials Development, Takasaki Radiation Chemistry Research Establishment, Japan Atomic Energy Research Institute, 1233 Watanuki, Takasaki, Gunma, 370-1292, Japan

    T. Yamaki, S. Yamamoto & H. Itoh

Authors
  1. R. Shinohara
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  2. T. Yamaki
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  3. S. Yamamoto
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  4. H. Itoh
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  5. K. Asai
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Shinohara, R., Yamaki, T., Yamamoto, S. et al. High-quality epitaxial TiO2 thin films grown on α-Al2O3 substrates by pulsed laser deposition. Journal of Materials Science Letters 21, 967–969 (2002). https://doi.org/10.1023/A:1016090110315

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  • DOI: https://doi.org/10.1023/A:1016090110315

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