Abstract
Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO2 with H2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO2 and H2O led to the formation of CH4 and CH3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.
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Ikeue, K., Nozaki, S., Ogawa, M. et al. Photocatalytic Reduction of CO2 with H2O on Ti-Containing Porous Silica Thin Film Photocatalysts. Catalysis Letters 80, 111–114 (2002). https://doi.org/10.1023/A:1015400223708
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DOI: https://doi.org/10.1023/A:1015400223708