Abstract
Zinc oxide (ZnO) thin films were prepared by a low cost chemical deposition technique using sodium zincate bath. Structural characterizations by X-ray diffraction technique (XRD) and scanning electron microscopy (SEM) indicate the formation of ZnO films, containing 0.05–0.50 μm size crystallites, with preferred c-axis orientation. The electrical conductance of the ZnO films became stable and reproducible in the 300–450 K temperature range after repeated thermal cyclings in air. Palladium sensitised ZnO films were exposed to toxic and combustible gases e.g., hydrogen (H2), liquid petroleum gas (LPG), methane (CH4) and hydrogen sulphide (H2S) at a minimum operating temperature of 150 °C; which was well below the normal operating temperature range of 200–400 °C, typically reported in literature for ceramic gas sensors. The response of the ZnO thin film sensors at 150 °C, was found to be significant, even for parts per million level concentrations of CH4 (50 ppm) and H2S (15 ppm).
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References
T. Seiyama, A. Kato, K. Fujiishi and M. Nagatani, Anal. Chem. 34 (1962) 102.
A. Jones, T. A. Jones, B. Mann and J. G. Griffith, Sensors and Actuators 5 (1984) 75.
G. Uozumi, M. Miyayama and H. Yanagida, J. Mater. Sci. 32 (1997) 2991.
S. Pizzini, N. Butta, D. Narducci and M. Palladino, J. Electrochem. Soc. 136 (1989) 1945.
T. Yamazaki, S. Wada, T. Noma and T. Suzuki, Sensors and Actuators B13/14 (1993) 594.
S. Basu and A. Datta, ibid. B22 (1994) 83.
P. Bonasewicz, W. Hirschwald and G. Neumann, Thin Solid Films 142 (1986) 77.
M. Ristov, G. J. Sinadinovski, I. Grozdanov and M. Mitreski, ibid. 149 (1987) 65.
A. Kuroyanagi, Jpn. J. Appl. Phys. 28 (1989) 219.
H. Gopalaswamy and P. J. Reddy, Semicond. Sci. technol. 5 (1990) 980.
A. Ghosh and S. Basu, Mater. Chem. Phys. 27 (1991) 45.
J. S. Kim, H. A. Marzouk, P. J. Reucroft and C. E. Hamrin, JR., Thin Solid Films 217 (1992) 133.
M. Peneza, C. Martucci, V. I. Anisimkin and L. Vasanelli, Mater. Sci. Forum 203 (1996) 137.
A. K. Mukhopadhyay, P. Mitra, D. Chattopadhyay and H. S. Maiti, J. Mater. Sci. Lett. 15 (1996) 431.
A. K. Mukhopadhyay, P. Mitra, A. P. Chatterjee and H. S. Maiti, ibid., in press.
H. Yoneyama, W. B. Li and H. Tamura, in “Chemical Sensors,” edited by T. Seiyama (Kodansha, Tokyo, 1983) p. 113.
P. Mitra, A. P. Chatterjee and H. S. Maiti, Mater. Lett., in press.
B. J. Aylett, in “Comprehensive Inorganic Chemistry,” Vol. 3, edited by J. C. Bailer, H. J. Emeleus, R. Nyholm and A. F. Trottman-Dickenson (Pergamon press, London, 1973) p. 187.
L. G. Berry (ed.), “Powder Diffraction File” (JCPDS, Philadelphia, 1960) Card No. 5–0664.
S. Devi and S. G. Prakash, Pramana-J. Phys. 39 (1992) 145.
J. C. Simpson and J. F. Cordaro, J. Appl. Phys. 63 (1988) 1781.
M. H. Sukker and H. L. Tuller, in “Advances in Ceramics,” Vol. 7, edited by M. F. Yan and A. H. Heuer (American Ceramic Society, Columbus, 1984) p. 71.
P. Esser and W. Gopel, Surf. Sci. 97 (1980) 309.
D. Eger, Y. Goldstein and A. Many, RCA Rev. 36 (1975) 508.
H. Nanto, T. Minami and S. Takata, J. Appl. Phys. 60 (1986) 482.
G. Heiland and D. Koehl, in “Chemical Sensor Technology,” Vol. 1, edited by T. Seiyama (Kodansha, Tokyo, 1988) p. 15.
S. P. S. Arya, A. D'amico and E. Verona, Thin Solid Films 157 (1988) 169.
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Chatterjee, A.P., Mitra, P. & Mukhopadhyay, A.K. Chemically deposited zinc oxide thin film gas sensor. Journal of Materials Science 34, 4225–4231 (1999). https://doi.org/10.1023/A:1004694501646
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DOI: https://doi.org/10.1023/A:1004694501646