Photodetectors based on amorphous and microcrystalline silicon
Introduction
Amorphous and microcrystalline silicon and its alloys are promising candidates for the realization of advanced sensing systems, solar cells/modules and thin-film transistors (TFT). They exhibit excellent optoelectronic properties and can be fabricated on large area and different kinds of substrates like glass, foils and crystalline silicon. Although solar modules based on a-Si:H/μc-Si:H tandem cell structure are close to the market [1], [2] and advanced sensing systems as color sensor arrays, position detectors and spectrometers were realized [3], [4], [5], questions regarding (i) the long-term stability of amorphous and microcrystalline silicon diodes and (ii) their different transient behavior still remain open.
Aspects as in-diffusion and adsorption of chemical species can affect the lifetime of the contacts and the optoelectronic properties of both the transparent conductive oxide (TCO) and the thin-film silicon device. In particular for μc-Si:H, where the microstructure can change from a more porous-like structure to a regime where amorphous growth prevails, various phenomena are reported [6], [7]. Therefore, within a comparative study of a-Si:H and μc-Si:H diodes the long-term stability of non-encapsulated thin-film diodes was studied by damp heat testing (temperature (T) = 85 °C, humidity = 85%), light soaking (AM 1.5 illumination condition, T = 50 °C) and high T-treatment (T = 150 °C) at dry atmosphere. The latter study was performed to further stress the multilayer system and find out an upper T limit of operation. The performance of the detectors was measured as a function of the exposure time.
Additionally, the dynamic property of the p-i-n photodetector was studied, which is of particular interest for a precise optimisation of the read out process. Therefore, the small signal frequency response was studied by the voltage- and frequency-dependent admittance measured by a LCR meter.
Section snippets
Experiment
The investigated a-Si:H and μc-Si:H p-i-n diodes were prepared in superstrate configuration on fluorine doped tin oxide (FTO, Asahi substrate) or sputtered aluminum doped ZnO (AZO) coated glass substrates. The absorber layer of a-Si:H and μc-Si:H p-i-n diodes is between 300 nm and 1 μm. The μc-Si:H diodes were prepared close to the transition region of amorphous growth where the maximum cell efficiency is achieved. For more details regarding the ZnO sputtering and PECVD processes see Refs. [8],
Long-term stability
The instability of ZnO concerning humidity and thin-film silicon during light soaking is well known. Therefore, we have investigated the long-term stability of a-Si:H and μc-Si:H solar cells on FTO and AZO substrates with a ZnO/Ag back contact during light soaking and damp heat testing by a comparative study. Fig. 1 shows a typical dark IV behavior of an a-Si:H (top) and a μc-Si:H (bottom) diode with an i-layer thickness of 400 nm and 1 μm, respectively, in the initial state and after 2070 h of
Conclusion
Detectors of a-Si:H and μc-Si:H show very similar, inherent, long-term stability behavior even after harsh environmental tests which recommends these detectors for different indoor and outdoor applications. Damp heat testing for 2000 h has a minor influence on the cell performance and high T treatment at 150 °C results only in a deterioration of the blue response of both diode types. Light soaking leads to the well-known Staebler–Wronski effect of a-Si:H diodes whereas the bulk properties of
Acknowledgements
The authors like to acknowledge J. Kirchhoff, W. Reetz and C. Zahren for their technical assistance and T. Repmann for the helpful discussions.
References (15)
- et al.
Sol. Energy Mater. Sol. Cells
(2001) - et al.
Thin Solid Films
(2003) - et al.
Thin Solid Films
(2003) - et al.
J. Non-Cryst. Solids
(2000) - et al.
- et al.
Appl. Phys. Lett.
(2006)
Cited by (17)
Microstructure characterization of high-temperature, oxidation-resistant Si-B-C-N films
2013, Thin Solid FilmsCitation Excerpt :Several applications require coatings to be exposed to high temperatures under which TiSiN [1,2], TiCN [3] and SiC-based [4,5] coatings are commonly inefficient due to their degradation at elevated temperatures.
Role of argon in hot wire chemical vapor deposition of hydrogenated nanocrystalline silicon thin films
2011, Thin Solid FilmsCitation Excerpt :These materials show interesting properties such as high conductivity, high charge carrier mobility and high doping efficiency [3–5]. Due to these properties nc-Si:H materials have attracted a great deal of attention in recent years in many potential applications such as third generation solar cells [6,7], photodiodes [8] and thin film transistors [4]. In general there are two methods used for the synthesis of nc-Si:H thin films, one is the re-crystallization of a-Si:H films and the other is the direct deposition.
Optical properties of Se or S-doped hydrogenated amorphous silicon thin films with annealing temperature and dopant concentration
2011, Journal of Alloys and CompoundsCitation Excerpt :For the past few years hydrogenated amorphous silicon (a-Si:H) thin films have been the subject of extensive studies due to their efficient optical and electrical properties, which allow them to be used in a variety of fields, such as photovoltaic solar cells [1–4], large area arrays of electronic devices [5], photosensors for the detection of bio-molecules [6,7], micro-electro-mechanical systems (MEMSs) [8,9], gas sensors [10,11], pixel detectors for high energy particles [12,13], optical imaging [14], photodetectors [15] and so on.
Electrical properties of a-Si:H thin films as a function of bonding configuration
2009, Solar Energy Materials and Solar CellsThin-film inverters based on high mobility microcrystalline silicon thin-film transistors
2008, Solid-State ElectronicsCitation Excerpt :However, the fabrication cost of poly-Si TFTs is higher due to high temperature or laser crystallization steps. An alternative material system, which has been shown high stability for sensor and solar cell applications [8] and superior carrier mobility exceeding 10 cm2/V s for electrons and holes in the TFTs [9–13], is microcrystalline silicon (μc-Si:H). The advance in terms of carrier mobility and device stability at low temperature (low cost) recommends the material system for more complex electronic circuitries to serve the advanced display applications such as fully integrated display backplanes or OLED displays.
Thermally Stable and Radiation-Proof Visible-Light Photodetectors Made from N-Doped Diamond
2023, Advanced Optical Materials