Defect evolution mechanism in U3Si2 from molecular dynamics simulations

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Abstract

U3Si2 is proposed as a promising candidate for accident tolerant fuel (ATF) in recent years. Compared to previous extensively-used UO2 fuel, U3Si2 has the advantage of a higher fissile density and thermal conductivity, which allows for extra coping time in case of accidents. The phase stability and thermophysical properties of U3Si2 have been studied previously with the purpose of evaluating its fuel performance. Nevertheless, the critical issue of irradiation damage in the U3Si2 fuel is still an underexplored area, and the evolution mechanism of irradiation-induced defects remains unclear. In this work, we perform molecular dynamics (MD) simulations to study defect evolution and defect properties in U3Si2. We simulate defect evolution by creating Frenkel defects directly in the system. We find that defects in U3Si2 prefer to form single or small defect clusters. With increasing defect concentration, amorphization is observed. To reveal the mechanism governing the observed defect evolution, we have carried out a systematic analysis of defect energetics and defect migration pathways in U3Si2. Our results indicate that VSi and Ui are stable defects after evolution, consistent with their low formation energies. Defect diffusion exhibits an anisotropic nature in U3Si2, with the fastest diffusion along the c direction instead of in the a-b plane for both vacancy and interstitial-mediated diffusion. These results are helpful in the understanding of irradiation behavior of U3Si2.

Introduction

U3Si2 has recently received considerable interest as a candidate for accident tolerant fuel (ATF) in existing and future light-water reactors (LWRs) [1,2]. Compared to the most commonly used commercial UO2 fuel, U3Si2 exhibits a higher fissile density and a higher thermal conductivity [3], both of which are beneficial in enhancing its fuel performance. On one hand, the high U density could reduce the requirement of fuel enrichment. On the other hand, the higher conductivity allows for better heat conduction and results in small temperature gradients across the fuel pellets. It also leads to rapid heat removal during accident scenarios.

To evaluate the fuel performance of U3Si2, previous researchers have been focused on its thermo-physical properties, including thermal and electrical conductivities [3,4], phase stabilities [5,6], point defect energies [7,8], grain boundary properties, and surfaces energies [9]. Inside reactors, U3Si2 would experience harsh conditions, including high temperatures and intense irradiations from energetic neutrons, resulting in severe radiation damage and corresponding microstructural changes. Besides, fission products, such as Xe gas, would lead to further degradation of fuel performance. Such changes depend critically on the defect evolution mechanism in U3Si2. Unfortunately, experimental data about the defect behavior in U3Si2 is rather limited; only some low-temperature irradiation test as dispersion fuel plates in research reactors is available [10]. Under neutron/ion irradiation, amorphization is found in U3Si2 [[11], [12], [13]]. At room temperature, it is demonstrated that the amount of damage resulting in amorphization is around 0.29–0.38 displacement per atom (dpa). At high temperatures, U3Si2 could be stabilized due to temperature-induced recovery. Recent irradiation experiments at a high temperature of 350 °C indicate that the crystal structure of U3Si2 is stable even up to a very high dose of 64 dpa [[14], [15], [16]]. Nevertheless, swelling and phase decomposition are observed in irradiated U3Si2 [13,14,17].

As a nuclear fuel, the properties of U3Si2 may get deteriorated by irradiation-induced microstructural changes due to defect accumulation. The effects have been observed in dispersion U3Si2 fuel. However, whether these observations are also operative in pellet fuel is not clear. In order to fully assess the performance of U3Si2, it is imperative to understand its defect evolution mechanism. In previous studies, the diffusion properties of point defects have been studied by ab initio calculations based on density functional theory (DFT) [7,8]. An anisotropic diffusion of point defects, which is attributed to the tetragonal crystal structure of U3Si2, was revealed by calculating the formation and migration energies of point defects. While such static calculations provide invaluable insight into the basic defect properties, a dynamic description would be highly helpful to predict defect evolution in U3Si2 at realistic conditions.

In this work, we employ molecular dynamics (MD) simulations to study the defect evolution mechanisms in the U3Si2 system. A newly developed empirical potential based on the modified embedded atom method (MEAM) is used [18]. To model defect evolution, we introduce different concentrations of Frenkel pair defects into the system and monitor the changes of defect configurations as a function of simulation time. We show that defects in U3Si2 tend to exist in the form of single defects or small defect clusters. With increasing defect concentration, amorphization of the system is observed. The most stable defects are Si vacancies and U interstitials, which can be understood by their low defect formation energetics. We also show that defect diffusion in U3Si2 is anisotropic: diffusion is faster along the c direction compared to that in the a-b plane.

Section snippets

Method

All simulations were performed using the large–scale atomic/molecular massively parallel simulator (LAMMPS) [19]. The recently developed MEAM potential for the U–Si system was used [18] to describe the interatomic interactions. Note that the MEAM library in the original version is modified according to the instruction given by the author. Simulations of defect evolution were performed within a 10 × 10 × 20 U3Si2 supercell containing 20,000 atoms. Periodic boundary conditions were applied in all

Result

In this work, defect evolution in U3Si2 is simulated by the Frenkel pair accumulation method. The initial defect configuration is generated by randomly displacing some atoms from their lattice sites to other positions. A minimum distance of 5 Å is implemented to avoid spontaneous recombination of the created interstitial-vacancy pairs. We do not distinguish the atom type in this process; both U and Si interstitials and vacancies are created. In addition, no constraints on the initial

Conclusion

In this work, defect evolution, defect energetics, and defect migration properties in a promising ATF U3Si2 are studied through MD simulations. Defect evolution is simulated directly by the Frenkel defect accumulation method. Our results indicate that most defects in U3Si2 form single or small defect clusters. With increasing defect concentration, amorphization is observed in the system. By analyzing defect energetics, we show that Si vacancies and U interstitials are two favorable defect types

CRediT authorship contribution statement

Shijun Zhao: Methodology, Data curation.

Declaration of competing interest

The authors declare no conflict of interests.

Acknowledgments

This work was supported by City University of Hong Kong (No. 9610425), Research Grants Council of Hong Kong (No. 21200919), and Shenzhen Basic Research Program (No. JCYJ20190808181601662).

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