On red-shift of UV photoluminescence with decreasing size of silicon nanoparticles embedded in SiO2 matrix grown by pulsed laser deposition
Introduction
Silicon is the mainstay semiconductor of contemporary microelectronic industry and now a days nanoscale silicon became an active area of research because of its potential for photonics [1], [2] and other applications [3]. For photonic applications, the research on nanoscale silicon is driven by the motivation to integrate optical and electronic functionalities in silicon. Observation of room temperature photoluminescence (PL) from Si nanostructures [4] initiated this research area and since then PL properties of silicon nanoparticles (Si-nps) grown under different experimental conditions have been extensively studied [5], [6], [7], [8], [9], [10], [11], [12], [13], [14], [15], [16], [17], [18], [19], [20], [21]. The PL emission spectra from Si-nps have been observed over different spectral ranges which almost cover the entire UV–visible and also sometimes the near infrared spectral range. Major factors attributed to influence the efficiency and the spectral ranges of PL emissions were particle size, size distribution, particle density and most importantly the surface/interface properties [9], [10], [11], [12], [13]. Therefore, based on the growth conditions and post-growth treatments like oxidation, annealing, etc. the dominance of the above mentioned factors ultimately decide the spectral range of PL emission. Possible mechanisms or origins of PL over different spectral ranges have also been discussed together with suitable theoretical models which include quantum confinement related direct or indirect band transitions, surface/interface defects, matrix effects, etc. [14], [15], [16], [17], [18], [19], [20], [21]. Although these studies have been carried out by many groups the origin of photoluminescence from Si nanoparticles is still a matter of debate, particularly PL emission in the UV spectral range [22], [23], [24], [25].
For practical applications of Si-nps in photonics and bio-imaging, UV range light emission or laser source from Si-nps is highly desirable. Therefore, the growth conditions of nanoparticles should be such that one can enhance UV light emission by subduing light emission in other wavelength ranges (which could be due to defects or otherwise) because, upon excitation, these sources of emission at other wavelengths provide additional de-excitation routes (radiative and non-radiative both) which reduces the efficiency of UV light emission. Capping Si-nps surface with a suitable wide band gap matrix is one good approach. Capping passivates the surface dangling bonds responsible for surface defect related emissions. It also provides isolation from the reactive environment and stability against aging effects. Pulsed laser deposition (PLD) has been considered as a suitable growth method amongst various other methods for the growth of Si-nps. Optimized PLD process parameters provide not only the control over the size of nanoparticles during the growth but in-situ growth of capping material as well [17], [22], [26]. Besides this the crystalline quality of the nanoparticles can also be improved with the post-annealing treatments at high temperatures [17].
In this work, we made an attempt to grow Si-nps with minimum surface defects by capping it with wide band gap SiO2 matrix. For the growth of Si-nps and SiO2 matrix we used KrF excimer laser based PLD. Nanoparticles size, size distribution and crystalline nature of Si-nps were confirmed using TEM, selected area electron diffraction (SAED) and Raman spectroscopy. We observed PL emissions from the ensemble of Si-nps in UV range and a small redshift of PL peak position with the decrease in the mean size of Si-nps. The low energy visible range PL emission bands were also observed but of low intensity compared to UV range PL. Based on the observations of size dependent anomalous red-shift of UV PL band together with PL lifetimes and PL excitation spectroscopy, we attribute the origin of UV range PL band as due to direct band recombination. These studies showed that using PLD, along with post annealing treatments, one not only can grow crystalline quality Si-nps but also achieve efficient capping of Si-nps with SiO2 matrix. This has led to reduced defect related visible range PL emission and observation of UV range PL from Si-nps. To the best of our knowledge there are no reports on UV PL ~3.2 eV from the core of the Si nanoparticles (and also redshift of PL peak with size decrease) in PLD based growth of Si-nps.
Section snippets
Experimental details
A KrF excimer laser (Coherent Compex Pro 205) operating at 10 Hz, 20 ns and 248 nm at a fluence of ~2 J/cm2 was utilized for pulsed laser deposition (PLD) process. A single crystal silicon wafer and sintered SiO2 pellet were used as ablation targets to grow Si-nps and the buffer/capping layers, respectively. Single crystal sapphire plates were used as the deposition substrates. Target to substrate distance was kept constant i.e. 4 cm. Deposition chamber was initially evacuated to a base pressure of
Results and discussion
Fig. 1(a) shows the TEM micrographs of single layer of Si-nps grown with increasing duration of silicon ablation. The ensembles of Si-nps observed through these micrographs were free of chunks and nanoparticles and were nearly spherical in shape. It is also observed that, with increasing deposition time the nanoparticles׳ size also grows with enhanced dispersion. At certain locations, preferably for longer deposition time, the particles are seen coalesced in these micrographs. Fig. 1(b) shows
Conclusion
We have grown ensembles of Si-nps embedded in SiO2 matrix using KrF excimer laser based pulsed laser deposition. We characterized the mean size (varying from 1–5 nm), size distribution and crystalline quality of Si-nps using TEM and Raman spectroscopy. Room temperature UV–vis PL was observed from Si-nps. In strongly confined Si-nps having size ≤4.8 nm the origin of dominant UV PL (peak ~3.2 eV) is attributed to direct band recombination from quantum confined Si-nps. Characteristic features of UV
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2019, Applied Surface ScienceCitation Excerpt :In our case, we focus on the possibility of converting UV photons into visible or infrared light. This conversion is known as “red-shift” or “down-shift” photoluminescence [3,6,7]. The photoluminescence behaviour directly depends on the nanoparticle structures [3,7–11], meaning that controlling size and density of the particles allow to tune their optical properties.