Elsevier

Journal of Luminescence

Volume 154, October 2014, Pages 178-184
Journal of Luminescence

On red-shift of UV photoluminescence with decreasing size of silicon nanoparticles embedded in SiO2 matrix grown by pulsed laser deposition

https://doi.org/10.1016/j.jlumin.2014.04.032Get rights and content

Highlights

  • Ensembles of Si nanoparticles of mean sizes 1–5 nm and capped with SiO2 were grown using pulsed laser deposition.

  • Photoluminescence emission was observed in UV–visible range from the grown ensembles of Si nanoparticles.

  • Redshift in the UV PL peak with decreasing size of Si nanoparticles was observed.

  • Origin of UV PL peak is attributed to direct band transition at the Г point of Si band structure.

Abstract

Ensembles of silicon nanoparticles (Si-nps) embedded in SiO2 matrix were grown by alternate ablation of Si and SiO2 targets using KrF excimer laser based pulsed laser deposition (PLD). The sizes of Si-nps (mean size ranging from 1–5 nm) were controlled by varying the ablation time of silicon target. Transmission electron microscopy (TEM) along with selected area electron diffraction (SAED) and Raman spectroscopy were used to confirm the growth of silicon nanoparticles, its size variation with growth time and the crystalline quality of the grown nanoparticles. TEM analysis showed that mean size and size distribution of Si-nps increased with increase in the ablation time of Si target. Intense peaks ~521 cm−1 in Raman analysis showed reasonably good crystalline quality of grown Si-nps. We observed asymmetric broadening of phonon line shapes which also redshift with decreasing size of Si-nps. Photoluminescence (PL) from these samples, obtained at room temperature, was broad band and consisted of three bands in UV and visible range. The intensity of PL band in UV spectral range (peak ~3.2 eV) was strong compared to visible range bands (peaks ~2.95 eV and ~2.55 eV). We observed a small red-shift (~0.07 eV) of peak position of UV range PL with the decrease in the mean sizes of Si-nps, while there was no appreciable size dependent shift of PL peak positions for other bands in the visible range. The width of UV PL band was also found to increase with decrease of Si-nps mean sizes. Based on the above observations of size dependent redshift of UV range PL band together with the PL lifetimes and PL excitation spectroscopy, the origin of UV PL band is attributed to the direct band transition at the Г point of Si band structure. Visible range bands were ascribed as defect related transitions. The weak intensities of PL bands ~2.95 eV and ~2.55 eV suggested that Si nanoparticles grown by PLD were efficiently capped or passivated by SiO2 with low density of surface/interface related defects.

Introduction

Silicon is the mainstay semiconductor of contemporary microelectronic industry and now a days nanoscale silicon became an active area of research because of its potential for photonics [1], [2] and other applications [3]. For photonic applications, the research on nanoscale silicon is driven by the motivation to integrate optical and electronic functionalities in silicon. Observation of room temperature photoluminescence (PL) from Si nanostructures [4] initiated this research area and since then PL properties of silicon nanoparticles (Si-nps) grown under different experimental conditions have been extensively studied [5], [6], [7], [8], [9], [10], [11], [12], [13], [14], [15], [16], [17], [18], [19], [20], [21]. The PL emission spectra from Si-nps have been observed over different spectral ranges which almost cover the entire UV–visible and also sometimes the near infrared spectral range. Major factors attributed to influence the efficiency and the spectral ranges of PL emissions were particle size, size distribution, particle density and most importantly the surface/interface properties [9], [10], [11], [12], [13]. Therefore, based on the growth conditions and post-growth treatments like oxidation, annealing, etc. the dominance of the above mentioned factors ultimately decide the spectral range of PL emission. Possible mechanisms or origins of PL over different spectral ranges have also been discussed together with suitable theoretical models which include quantum confinement related direct or indirect band transitions, surface/interface defects, matrix effects, etc. [14], [15], [16], [17], [18], [19], [20], [21]. Although these studies have been carried out by many groups the origin of photoluminescence from Si nanoparticles is still a matter of debate, particularly PL emission in the UV spectral range [22], [23], [24], [25].

For practical applications of Si-nps in photonics and bio-imaging, UV range light emission or laser source from Si-nps is highly desirable. Therefore, the growth conditions of nanoparticles should be such that one can enhance UV light emission by subduing light emission in other wavelength ranges (which could be due to defects or otherwise) because, upon excitation, these sources of emission at other wavelengths provide additional de-excitation routes (radiative and non-radiative both) which reduces the efficiency of UV light emission. Capping Si-nps surface with a suitable wide band gap matrix is one good approach. Capping passivates the surface dangling bonds responsible for surface defect related emissions. It also provides isolation from the reactive environment and stability against aging effects. Pulsed laser deposition (PLD) has been considered as a suitable growth method amongst various other methods for the growth of Si-nps. Optimized PLD process parameters provide not only the control over the size of nanoparticles during the growth but in-situ growth of capping material as well [17], [22], [26]. Besides this the crystalline quality of the nanoparticles can also be improved with the post-annealing treatments at high temperatures [17].

In this work, we made an attempt to grow Si-nps with minimum surface defects by capping it with wide band gap SiO2 matrix. For the growth of Si-nps and SiO2 matrix we used KrF excimer laser based PLD. Nanoparticles size, size distribution and crystalline nature of Si-nps were confirmed using TEM, selected area electron diffraction (SAED) and Raman spectroscopy. We observed PL emissions from the ensemble of Si-nps in UV range and a small redshift of PL peak position with the decrease in the mean size of Si-nps. The low energy visible range PL emission bands were also observed but of low intensity compared to UV range PL. Based on the observations of size dependent anomalous red-shift of UV PL band together with PL lifetimes and PL excitation spectroscopy, we attribute the origin of UV range PL band as due to direct band recombination. These studies showed that using PLD, along with post annealing treatments, one not only can grow crystalline quality Si-nps but also achieve efficient capping of Si-nps with SiO2 matrix. This has led to reduced defect related visible range PL emission and observation of UV range PL from Si-nps. To the best of our knowledge there are no reports on UV PL ~3.2 eV from the core of the Si nanoparticles (and also redshift of PL peak with size decrease) in PLD based growth of Si-nps.

Section snippets

Experimental details

A KrF excimer laser (Coherent Compex Pro 205) operating at 10 Hz, 20 ns and 248 nm at a fluence of ~2 J/cm2 was utilized for pulsed laser deposition (PLD) process. A single crystal silicon wafer and sintered SiO2 pellet were used as ablation targets to grow Si-nps and the buffer/capping layers, respectively. Single crystal sapphire plates were used as the deposition substrates. Target to substrate distance was kept constant i.e. 4 cm. Deposition chamber was initially evacuated to a base pressure of

Results and discussion

Fig. 1(a) shows the TEM micrographs of single layer of Si-nps grown with increasing duration of silicon ablation. The ensembles of Si-nps observed through these micrographs were free of chunks and nanoparticles and were nearly spherical in shape. It is also observed that, with increasing deposition time the nanoparticles׳ size also grows with enhanced dispersion. At certain locations, preferably for longer deposition time, the particles are seen coalesced in these micrographs. Fig. 1(b) shows

Conclusion

We have grown ensembles of Si-nps embedded in SiO2 matrix using KrF excimer laser based pulsed laser deposition. We characterized the mean size (varying from 1–5 nm), size distribution and crystalline quality of Si-nps using TEM and Raman spectroscopy. Room temperature UV–vis PL was observed from Si-nps. In strongly confined Si-nps having size ≤4.8 nm the origin of dominant UV PL (peak ~3.2 eV) is attributed to direct band recombination from quantum confined Si-nps. Characteristic features of UV

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