Elsevier

Journal of Luminescence

Volumes 122–123, January–April 2007, Pages 660-662
Journal of Luminescence

Improved efficiency in OLEDs with a thin Alq3 interlayer

https://doi.org/10.1016/j.jlumin.2006.01.253Get rights and content

Abstract

We demonstrate an improved efficiency in OLEDs with a thin Alq3 interlayer, which is inserted into the hole-transport layer for adjusting the hole-injection and transport, and improving the hole-electron balance. The thin Alq3 interlayer can effectively influence the electrical performance and electroluminescence (EL) efficiency of the devices. The devices with an optimum Alq3 interlayer exhibit a maximum EL efficiency of around 3.3 cd/A, which is improved by a factor of two over the conventional devices (1.6 cd/A) without the interlayer.

Introduction

Tris-8-hydroxyquinoline aluminum (Alq3) is one of the most widely used materials as the emission layer (EML) and electron transport layer (ETL) in organic light-emitting devices (OLEDs) due to its good luminescent properties, high electron mobility, and excellent thermal stability [1], [2]. However, in typical vacuum-deposited OLEDs with diamine derivatives (e.g. TPD or NPB) as the hole-transport layer (HTL) and Alq3 as the EML/ETL, the majority carriers are holes due to the relatively efficient hole-injection from the HTL–anode interface and the sufficiently high hole-mobility in the HTL [2], [3], [4]. It is generally recognized that the balanced carriers is desirable for high electroluminescence (EL) efficiency.

It has been reported that the hole-injection from anode can be adjusted by inserting a buffer layer between the indium tin oxide (ITO) anode and HTL. Copper phthalocyanine (CuPc) [5], silicon oxynitride [6], and LiF [7], have been deposited onto ITO surface as an effective buffer layer for efficiency and stability enhancement. Liew et al. have found that OLEDs with a thin Alq3 buffer layer upon ITO anode possesses higher EL efficiency and longer stability due to the reduction of hole-injection from ITO to HTL [8]. Qiu et al. [9] have demonstrated OLEDs with improved hole-electron balance by using CuPc/NPB multiple-quantum-well structure, which could decrease the hole-mobility effectively.

In this article, we demonstrate an efficiency improvement in OLEDs by inserting a thin Alq3 interlayer into HTL so as to adjust the hole-injection and transport, and to improve the hole-electron balance. The devices with a thin Alq3 interlayer exhibit significantly improved EL efficiency compared to the conventional devices. We propose that the improvement may result from enhanced hole-electron balance or double-layer light emission.

Section snippets

Experiment

The device structure used in this study is ITO/TPD (x nm)/Alq3 (5 nm)/TPD (40-x nm)/Alq3 (55 nm)/Al, where x is the distance between the 5 nm Alq3 interlayer and ITO anode, varied from 0 to 30 nm. The bilayer devices with structure of ITO/TPD (40 nm)/Alq3 (60 nm)/Al have been fabricated as the conventional devices for comparison. All devices were prepared in a high vacuum chamber at a base pressure of 6×10−4 Pa. The TPD, Alq3 (from Tokyo Kasei Kogyo Co. Ltd. and used as received without purification),

Results and discussion

Fig. 1 shows the typical JV (a) and EL efficiency-J (b) characteristics of the devices with 5 nm Alq3 interlayer, in which the distance between the Alq3 interlayer and ITO anode is varied from 0 to 30 nm. Compared to the conventional device, the devices with the Alq3 interlayer apparently exhibit lower current density but higher EL efficiency. As the distance between the Alq3 interlayer and ITO anode decreases, the hole injection from ITO to TPD or/and transport in TPD decrease due to the

Conclusion

We have demonstrated an efficiency improvement in OLEDs by introducing a thin Alq3 interlayer into HTL layer to adjust the hole-injection and transport, and to improve the hole-electron balance. The thin Alq3 interlayer effectively influenced the electrical performance and balanced the hole-electron carriers. OLEDs with a thin Alq3 interlayer, inserted at an optimum location in HTL, exhibited a maximum EL efficiency of around 3.3 cd/A, which was about twice as that of conventional devices (1.6 

Acknowledgement

This work is partially supported by the Department of Science and Technology of Guangzhou Municipality under Grant no. 2004J1-C0011, and the Doctoral Foundation from Ministry of Education of China under Grant no. 20040558008.

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