Further improving the mechanical and tribological properties of low content Ti-doped DLC film by W incorporating
Introduction
Diamond-like carbon (DLC) film as an effective protected coating, due to its excellent physicochemical properties like high hardness, low friction coefficient and wear, is promising candidate for reducing the wear loss during manufacturing operations including machining and tribological systems such as the plungers running against the cylinder in fuel injection system of automotives [1], [2], [3], [4], [5]. Unfortunately, poor adhesive strength with metallic substrates is the major drawback, which severely limits the successful application of DLC films. Overall, two main reasons are expected to explain it. On the one hand, high residual stress ranging from 1 to 10 GPa lead to spall off from metallic substrates, at the same time, limit the film thickness [6], [7], [8]. This one could be effectively solved by the doping elements such as Ti, Cr, W and so on [9], [10], [11]; On the other hand, weak adhesive strength at the boundary between the film and substrate, which could be solved by the introduction of the addition Me, MeXC, MeXN interlayer [12], [13], [14]. Above mentioned these attempts to enhance the adhesion have proved to be very successful, but most works are based on the cost of sacrificing the mechanical properties [15], [16]. Fortunately, our previous studies indicated that the introduction of low content Ti not only significantly reduced the residual stress but also retained the high hardness [17], [18].
However, our works has only shown that the internal stress has been effectively reduced without changing the hardness by incorporating low content Ti atoms. On the basis of it, if other elements were also introduced into the low content Ti-doped DLC film, so that it can effectively enhance the hardness. Namely, if the incorporated elements could be introduced successfully into the DLC films together and carried out “their duties”, so more excellent properties could be obtained. Silva et al. [19] found that the addition of W atom led to a significant hardening of the DLC coating from 10 GPa to 18 GPa. Yue and co-workers [20] investigated the W-doped DLC film, and found that the W content increased to 10.73 at.%, the hardness is increased to ∼20 GPa, they all suggested that the enhancement of the hardness is probably due to the formation of hard phase WC disperses in the carbon matrix. Besides, many other researches also indicated that W is considered an effective doping element especially in improving the high temperature tribological properties of film [21], [22].
In this study, W/Ti-doped DLC films with the different W content were deposited on the Si substrate by co-sputtering W and Ti targets in methane and argon mixture atmosphere. Our concept is W and Ti atom will not react to generate the intermetallic compounds, that may produce synergies between them in the film. The purpose of this work is to further improve the performance of low content Ti-doped DLC film by W incorporating, so that it can fully meet the needs of industrial applications. Although a lot of research works have been carried out about W-doped DLC films and Ti-doped DLC films, there is few works about the effect of W on the mechanical and tribological of low content Ti-doped DLC film. Therefore, mechanical properties and tribological performances of the W/Ti-doped films were investigated systematically based on the composition and microstructure analysis.
Section snippets
Films deposition
W/Ti-doped hydrogenated amorphous diamond like carbon (DLC) films were prepared on n-type silicon (1 0 0) wafers by middle frequency sputtering using Ar and CH4 as the feedstock. Fig. 1 shows the schematic diagram of the middle frequency sputtering system for the present film deposition. The volume of the vacuum chamber was 0.8 m3. Two rectangular targets fitted in an industrial chamber were used: titanium twin target (not shown in Fig. 1) with 100 mm × 672 mm to deposit adhesion improving interlayer;
SEM and HRTEM morphologies
Typical cross-sectional SEM morphologies of the as-deposited films are displays in Fig. 2. It can be seen that all films are consisted of two distinct phases corresponding to W/Ti-DLC top layer, Ti interlayer, respectively. The thickness of Ti interlayer is measured to be approximately 195 ± 15 nm, and the W/Ti-DLC top layer is 400 ± 15 nm, which is in accordance with the designed thickness. Obviously, the total thickness of all films were designed a constant value of ∼600 nm in order to minimize the
Conclusions
W/Ti-doped DLC film with the different W content were prepared on the Si substrate by varying the W target current using the Ar and CH4 as the working gas, the W atom was introduced into the low content Ti-doped DLC film in order to further improve its mechanical and tribological performance. All films with a stable thickness value of ∼600 ± 15 nm showed the amorphous characteristics by the HRTEM analysis. The results from the XPS and Raman analysis indicated that the Ti contents were controlled
Acknowledgments
The authors are grateful to the 973 program 2013CB632300 and the National Natural Science Foundation of China (Grant no. 51275508, 51205383) for financial support.
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