Sheath evolution in electronegative plasma

https://doi.org/10.1016/S0010-4655(02)00355-7Get rights and content

Abstract

The transport of electrons and ions to metal substrates in low-temperature three-component plasma is studied by computer simulation techniques in a one-dimensional approximation for planar and spherical geometries. The modeled O2/Ar plasma consists of positive argon and oxygen ions, negative oxygen ions and electrons in various proportions. The spatial and temporal evolution of the distributions of individual species as well as the dynamics of the electric potential distribution in the boundary layer between plasma and substrates is investigated. Further results concern fluxes of charged species to substrates during the swap of voltage bias.

References (7)

  • R. Hrach et al.

    Vacuum

    (2001)
  • W. Schmitt et al.

    Contrib. Plasma Phys.

    (1993)
  • T.H. Chung et al.

    Jpn. J. Appl. Phys.

    (1997)
There are more references available in the full text version of this article.

Cited by (0)

View full text