Oxidation and annealing of GaP and GaAs (111)-faces studied by AES and UPS

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Abstract

The annealing behaviour after argon sputtering and the first steps of oxidation of the polar GaP and GaAs (111)-faces are studied by AES and UPS. The Auger spectrum of GaP is briefly discussed. In contrast to GaAs, the GaP surfaces show a gallium accumulation after argon sputtering, but they become stoichiometric by annealing. The photoemission spectra show an additional emission due to oxygen with its maximum at about 5 eV below the valence band edge. The decrease of the emission near the valence band edge by oxidation shows the existence of surface sensitive states. Comparing the results of the two polar faces and for different surface compositions, it is concluded that these states are mainly As- and P-derived, respectively. A linear relationship is found between the UPS and Auger signal of oxygen.

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