Growth of iridium films by metal organic chemical vapour deposition
References (11)
- et al.
Surf. Sci.
(1992) - et al.
Mater. Sci. Eng. B
(1993) - et al.
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Thermodynamic study of volatile iridium (I) complexes with 1,5-cyclooctadiene and acetylacetonato derivatives: Effect of (O,O) and (O,N) coordination sites
2019, Journal of Chemical ThermodynamicsCitation Excerpt :To obtain the quantitative data on the volatility of new complexes 2 and 3, we have carried out the measurements of the temperature dependencies of saturated vapor pressure using flow (transpiration) method as the closest to the experimental conditions in the flow type MOCVD reactors. For complex 1, some thermodynamic information on the sublimation process has been published earlier [29,36], but the data presented are not passably correlated. In particular, the sublimation enthalpy calculated from the Arrhenius plot of the evaporation rate gravimetrically determined by the decrease in the sample mass in the helium flow in the MOCVD evaporator in the temperature interval (388 – 408) K was (84 ± 4) kJ mol−1 [36].
Low-temperature heat capacity of Ir(C<inf>5</inf>H<inf>7</inf>O<inf>2</inf>)(C<inf>8</inf>H<inf>12</inf>)
2016, Journal of Chemical ThermodynamicsCitation Excerpt :Due to these properties, the iridium films are used in several essential applications such as in catalysts [1], spark plugs [2], protective coatings [3,4] and implanted electrodes [5]. The thermal decomposition of metal–organic compound (precursor) vapors on heating surfaces (metal–organic chemical vapor deposition or MOCVD) is one of the most suitable methods to obtain thin film of refractory metals [6–8]. The investigation of thermodynamic properties of volatile precursors is demanded to optimize conditions of obtaining the target films by MOCVD.
Iridium coatings grown by metal-organic chemical vapor deposition hot-wall CVD reactor
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2003, Surface and Coatings TechnologyHigh-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors
2022, ACS Applied Materials and Interfaces