Reaction kinetics of the formation of indium tin oxide films grown by spray pyrolysis
References (11)
- et al.
Thin Solid Films
(1981) - et al.
Thin Solid Films
(1989) - et al.
J.P. Fillard
Thin Solid Films
(1977) - et al.
Thin Solid Films
(1981) Thin Solid Films
(1984)Thin Solid Films
(1984)
Cited by (28)
Effect of gamma irradiation dose on the structure and pH sensitivity of ITO thin films in extended gate field effect transistor
2019, Results in PhysicsCitation Excerpt :Furthermore, the deposition of ITO film involves the generation of a huge concentration of oxygen vacancies and alternate tin dopants, which leads to increased conductivity of the film [6]. There are various deposition techniques for synthesizing ITO films, such as; chemical vapor deposition (CVD) [7], electron-beam evaporation [8], magnetron sputtering [9–10], pulsed laser deposition (PLD) [11–12] and spray pyrolysis [13]. On the other hand, the ion-sensitive field effect transistor (ISFET) is the foremost electrochemical sensor to use MOSFET.
Influence of substrate temperature on structural and optical properties of ZnO thin films prepared by cost-effective chemical spray pyrolysis technique
2016, Superlattices and MicrostructuresThickness of ITO thin film influences on fabricating ZnO nanorods applying for dye-sensitized solar cell
2015, Composites Part B: EngineeringCitation Excerpt :Comparing to FTO and AZO, the ITO substrates show more advantages such as higher transparency, conductivity and binding strength, especially easier fabrication. Therefore it was considered as a good alternative substrate material for DSSC applications [22–26]. In this paper, it is first time to discover the relationship between the ITO substrates and as-deposited ZnO film, which further influenced the properties of morphology of ZnO nanostructures formed in reducing annealing method.
ITO/Au/ITO multilayer electrodes for CuPc/C<inf>60</inf> solar cells
2012, Energy ProcediaOn the structural, morphological, optical and electrical properties of sol-gel deposited ZnO:In films
2010, Thin Solid FilmsCitation Excerpt :Films are generally used as transparent electrodes or buffer layers. Different transparent conducting oxide films [1–5] were investigated, various deposition methods such as: oxidation [6,7], reactive evaporation [8,9], spray pyrolysis [10–12], sputtering [13,14], spray CVD [15–17] and numerous analysis both experimentally and theoretically, by numerical simulations [18,19] were employed in order to improve different deposition system configurations and films properties. ITO is the usual transparent conducting oxide electrode used in the third generation solar cells, however due to the high cost of these films and the induced problems of degradation, in the last few years a special attention was attributed to zinc oxide and especially to aluminium doped zinc oxide films.
Opto-electronic properties of chromium doped indium-tin-oxide films deposited at room temperature
2008, Materials Science and Engineering: B