Elsevier

Thin Solid Films

Volume 582, 1 May 2015, Pages 323-327
Thin Solid Films

The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

https://doi.org/10.1016/j.tsf.2014.11.062Get rights and content
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Highlights

  • Pulsed DC magnetron sputtering (PDCMS) of CdS films

  • Chemical bath deposition of CdS films

  • Comparison between CdS thin films deposited by chemical bath and PDCMS techniques

  • High deposition rate deposition for PDCMS deposition

  • Uniform, pinhole free CdS thin films

Abstract

Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV–Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing.

Keywords

Pulsed direct-current magnetron sputtering
Chemical bath deposition
Cadmium sulphide
Thin films
Film uniformity
Pinhole free films
Void-free films

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