Elsevier

Optics Communications

Volume 281, Issue 8, 15 April 2008, Pages 1950-1953
Optics Communications

Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals

https://doi.org/10.1016/j.optcom.2007.12.056Get rights and content

Abstract

Flexible coherent diffraction lithography is proposed and preliminarily tested by means of an optical phase mask. The phase mask consisted of a two-dimensional hexagonal lattice of reversed ferroelectric domains engineered in a z-cut lithium niobate substrate and was electro-optically tunable. Appropriate phase shift values across adjacent reversed domains were induced by the application of an external electric field along the z-axis of the crystal via transparent electrodes. Photolithographic exposures of the self-imaging near-field diffraction intensity patterns, at various planes corresponding to the Talbot distances, were performed by using different values of the driving electric field signal.

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