Abstract
N-channel depletion MOSFETs are irradiated with 140 MeV silicon ions (Si10+) and 60Co gamma radiation separately from 100 krad to 100 Mrad of total dose. The current–voltage (I-V) variations in MOSFETs are characterized systematically before and after 140 MeV silicon ion and 60Co gamma irradiation. Threshold voltage (VTH), leakage current (IL), density of oxide trapped charges (ΔNit) and density of interface trapped charges (ΔNot) are measured. The impact of 60Co gamma radiation on VTH, IL, ΔNit and ΔNot of MOSFETs is found to be more when compared to 140 MeV silicon ions. Isothermal annealing studies are performed on the irradiated devices, and the recovery in VTH is observed to be more in the case of 140 MeV silicon ions-irradiated MOSFETs when compared to 60Co gamma-irradiated MOSFETs.
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Acknowledgements
The author acknowledge with thanks to IUAC, New Delhi for high energy ion irradiation facility and Pondicherry University, Puducherry, for 60Co gamma irradiation facility. Author also thanks Mrs. Arshiya Anjum, University of Mysore, in completion of this experimental work.
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Pushpa, N. 60Co gamma and high energy ion impacts on threshold characteristics and its recovery in N-channel depletion MOSFETs. Indian J Phys 97, 1087–1092 (2023). https://doi.org/10.1007/s12648-022-02447-4
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DOI: https://doi.org/10.1007/s12648-022-02447-4