Abstract
Ultrafine Si embedded SiO2 nanowires have been prepared by thermal evaporation using Pt catalyst. The ultrafine Si embedded SiO2 nanowires with a diameter of about 10 nm were grown in-situ on the Si substrate, conforming to a vapor-liquid-solid growth mechanism. On account of the existence of the quantum confinement effect, the absorption edge of the ultrafine Si embedded SiO2 nanowires is slightly larger. The photoluminescence result reveals a blue shift in the ultrafine nanowires, which may also be due to the quantum confinement effect caused by the small size. The Pt-related light emission characteristics will enable the development of nanowires in the field of optoelectronics.
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Acknowledgements
The authors would like to express their gratitude to the reviewers of the manuscript for their valuable suggestions and comments.
Funding
This work was financially supported by the National Natural Science Foundation of China (12004050) and Foundation of Liaoning Educational Committee (LJKQZ2021137, LJKZ1024), the project of Liaoning Provincial Science and Technology Program 2018 (20180550449). Portions of this work were performed at 4W2 beamline, Beijing Synchrotron Radiation Facility (BSRF), which is supported by Chinese Academy of Sciences (grant no. KJCX2-SW-N20, KJCX2-SW-N03).
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Xibao Yang: Conceptualization, Investigation, Formal analysis, Project administration, Supervision, Methodology, Resources. Hang Lv: Conceptualization, Investigation, Supervision, Writing - original draft, Project administration, Writing - review & editing. Shuanglong Chen: Data curation.Qiushi Wang: Validation, Resources, Methodology. Linhai Jiang: Conceptualization, Methodology, Resources, Formal analysis. Hang Lv and Xibao Yang wrote the main manuscript. All authors reviewed the manuscript.
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Yang, X., Lv, H., Chen, S. et al. Growth of Ultrafine Si Embedded SiO2 Nanowires by Pt Catalyst. Silicon 15, 6825–6831 (2023). https://doi.org/10.1007/s12633-023-02538-9
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DOI: https://doi.org/10.1007/s12633-023-02538-9