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Microtribological Mechanisms of Tungsten and Aluminum Nitride Films

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Abstract

Microtribology experiments were carried out on the W1−x Al x N films, deposited by radio frequency magnetron reactive sputtering on 304 stainless steel substrates and Si(100). Film wear mechanisms were investigated from the evolution of the friction coefficient and scanning electron microscopy observations. The results show that the WAlN films consist of a mixture of face-centered cubic W(Al)N and hexagonal wurtzite structure AlN phases and the preferred orientation changes from (111) to (200). The film damage after sliding test is mainly attributed to the composition and microstructure of the films. The amount of debris generated by friction is linked to the crack resistance. The better tribological properties for W1−x Al x N films (x < 0.4) are mainly determined by the higher toughness.

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Acknowledgment

This work is supported by the Research Innovation Program for College Graduates of Jiangsu Province (CXZZ13_0718).

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  1. School of Materials Science and Engineering, Tianjin University, Weijin Road 92, Tianjin, 300072, China

    Hongjian Zhao, Chunyan Mu & Fuxing Ye

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  1. Hongjian Zhao
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  2. Chunyan Mu
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Correspondence to Hongjian Zhao.

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Zhao, H., Mu, C. & Ye, F. Microtribological Mechanisms of Tungsten and Aluminum Nitride Films. J. of Materi Eng and Perform 25, 1446–1452 (2016). https://doi.org/10.1007/s11665-016-2008-5

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  • DOI: https://doi.org/10.1007/s11665-016-2008-5

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