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Fabrication of 3-D Submicron Glass Structures by FIB

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Abstract

The fabrication characteristic of focused ion beam (FIB) for Pyrex glass was investigated. FIB has several advantages such as high resolution, high material removal rates, low forward scattering, and direct fabrication in selective area without any etching mask. In this study, FIB-etched Pyrex glass was used for fast fabrication of 3-D submicron structures. A glass structure with 0.39 μm in width was fabricated. The experimental results in terms of limiting beam size, ion dose (ion/cm2), and beam current are discussed. The influence of XeF2 gas on FIB glass fabrication was investigated.

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Acknowledgments

The authors would like to thank the Center for Nanoscience & Nanotechnology, National Sun Yat-Sen University, Kaoshiung, Taiwan, for equipment access and technical support, and National Science Council (NSC) for their financial supports to the project (Grant numbers: NSC97-2218-E-006-009, NSC94-2213-E-110-043, NSC 94-2212-E110-015, NSC94-2622-E-110-017-CC3, and NSC95-2221-E-110-011-). The authors would like to thank the Center for Micro/Nano Technology Research, National Cheng Kung University, Tainan, Taiwan, for equipment access and technical support as well.

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Authors and Affiliations

  1. Department of Mechanical and Electro-Mechanical Engineering, and Center for Nanoscience & Nanotechnology, National Sun Yat-Sen University, Kaoshiung, 804, Taiwan

    C.H. Chao & J.R. Wu

  2. Department of Systems and Naval Mechatronic Engineering, National Cheng Kung University, Tainan, 701, Taiwan

    S.C. Shen

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  1. C.H. Chao
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  2. S.C. Shen
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Correspondence to S.C. Shen.

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Chao, C., Shen, S. & Wu, J. Fabrication of 3-D Submicron Glass Structures by FIB. J. of Materi Eng and Perform 18, 878–885 (2009). https://doi.org/10.1007/s11665-008-9318-1

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  • DOI: https://doi.org/10.1007/s11665-008-9318-1

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