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Carbon Nanotubes/FeSiAl Hybrid Flake for Enhanced Microwave Absorption Properties

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Abstract

Developing high-performance microwave-absorbing microscale materials is still a challenge for practical anti-electromagnetic interference applications. Herein, a facile strategy for constructing carbon nanotubes (CNTs)/FeSiAl flake composites through in situ growth of CNTs on FeSiAl microscale flakes is developed. The Fe nanoparticles on the oxide surfaces of the FeSiAl flakes serve as catalyst for CNTs. The amount and size of CNTs is adjusted by the reaction temperature and time. Thanks to the optimal interface between CNTs and FeSiAl, the flake morphology of the FeSiAl alloy and the porous structure of dielectric CNTs, proper impedance match, improved microwave absorptivity, increased attenuation ability and enhanced loss capability result in good microwave-absorbing behavior, demonstrating an effective absorption bandwidth of 3.52 GHz (12–15.52 GHz) with 1.7 mm, and minimal reflection loss of −47.32 dB at 9.12 GHz and 2.4 mm. This work provides an effective method for designing and preparing high-performance microscale microwave absorbents.

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Acknowledgments

This work was financially supported by the Fundamental Research Funds for the Provincial Universities of Zhejiang (No. GK 209907299001-002), Key Research and Development plan of Zhejiang Province (No. 2020C05014).

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Authors and Affiliations

  1. Institute of Advanced Magnetic Materials, College of Materials and Environmental Engineering, Hangzhou Dianzi University, Hangzhou, 310012, China

    Hongyan Li, Hang Cheng, Hongjin Liu, Long Long & Xianguo Liu

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  1. Hongyan Li
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  2. Hang Cheng
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  3. Hongjin Liu
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  5. Xianguo Liu
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Contributions

HL: Methodology and Writing-original draft; HC: Paper revision and Simulation; HL: Methodology; LL: Conceptualization; XL: Editing and English correction, Supervision, financial support.

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Correspondence to Xianguo Liu.

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Li, H., Cheng, H., Liu, H. et al. Carbon Nanotubes/FeSiAl Hybrid Flake for Enhanced Microwave Absorption Properties. J. Electron. Mater. 51, 6986–6994 (2022). https://doi.org/10.1007/s11664-022-09928-6

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  • DOI: https://doi.org/10.1007/s11664-022-09928-6

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