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Phase Changes of 4H-SiC in Excimer Laser Doping

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Abstract

To understand the mechanism of laser doping by a KrF excimer laser, we have experimentally evaluated the structural changes of 4H-SiC in the doping-capable region (the region where ablation does not occur and the temperature does not exceed the peritectic temperature). In the previous report, the calculation result assuming that the crystal state of SiC may change due to laser irradiation even in the doping-capable region was reported. In this study, it is experimentally confirmed that the phase change of 4H-SiC depends on the volume density of the total number of photons by laser irradiation even before ablation conditions. As a result, it was found that the model of the phase change of 4H-SiC in excimer laser doping can be considered as the synthesis of state change by photomechanical reaction in addition to photothermal and photochemical reactions.

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References

  1. T.F. Deutsch, J.C.C. Fan, G.W. Turner, R.L. Chapman, D.J. Ehrilich, and R.M. Osgood, Electrical properties of laser chemically doped silicon. Appl. Phys. Lett. 38, 144 (1981).

    Article  CAS  Google Scholar 

  2. I.A. Salama, N.R. Quick, and A. Kar, Laser doping of silicon carbide substrates. J. Electron. Mater. 31, 200 (2002).

    Article  CAS  Google Scholar 

  3. Z. Tian, N.R. Quick, and A. Kar, Laser-enhanced diffusion of nitrogen and aluminum dopants in silicon carbide. Acta Mater. 54, 4273 (2006).

    Article  CAS  Google Scholar 

  4. S. Bet, N. Quick, and A. Kar, Effect of laser field and thermal stress on diffusion in laser doping of SiC. Acta Mater. 55, 6816 (2007).

    Article  CAS  Google Scholar 

  5. P.E. Pehrsson and R. Kaplan, Excimer laser cleaning, annealing, and ablation of SiC. J. Mater. Res. 4, 1480 (1989).

    Article  CAS  Google Scholar 

  6. I. Choi, H.Y. Jeong, H. Shin, G. Kang, M. Byun, H. Kim, A.M. Chitu, J.S. Im, R.S. Ruoff, S.Y. Choi, and K.J. Lee, Laser-induced phase separation of silicon carbide. Nat. Commun. 7, 1 (2016).

    Google Scholar 

  7. Y. Usami, K. Imokawa, R. Nohdomi, A. Sunahara, and H. Mizoguchi, Adaptation of TCAD simulation in excimer laser doping. Jpn. J. Appl. Phys. 60, 086502 (2021).

    Article  CAS  Google Scholar 

  8. A.F. Mohammed, Q.A. Al-Jarwanyac, A.J. Clarkea, T.M. Amarald, J. Lawrencee, N.T. Kempa, and C.D. Waltona, Ablation threshold measurements and surface modifications of 193 nm laser irradiated 4H-SiC. Chem. Phys. Lett. 713, 194 (2018).

    Article  CAS  Google Scholar 

  9. A. Saliminia, N.T. Nguyen, M.-C. Nadeau, S. Petit, S.L. Chin, and R. Vallée, Writing optical waveguides in fused silica using 1 kHz femtosecond infrared pulses. J. Appl. Phys. 93, 3724 (2003).

    Article  CAS  Google Scholar 

  10. C. Li, X. Shi, J. Si, F. Chen, T. Chen, Y. Zhang, and X. Hou, Photoinduced multiple microchannels inside silicon produced by a femtosecond laser. Appl. Phys. B 98, 377 (2010).

    Article  CAS  Google Scholar 

  11. J.F. DiGregorio and T.E. Furtak, Analysis of residual stress in 6H-SiC particles within Al2O3/SiC composites through Raman spectroscopy. J. Am. Ceram. Soc. 75, 1854 (1992).

    Article  CAS  Google Scholar 

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Acknowledgments

The authors would like to thank Mr. Masaharu Edo and Dr. Shinya Takashima of Fuji Electric Co., Ltd. for the discussion about data. This work was done for the Council for Science, Technology and Innovation (CSTI), Cross-ministerial Strategic Innovation Promotion Program (SIP), “Photonics and Quantum Technology for Society 5.0” (Funding agency, QST).

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Correspondence to Yasutsugu Usami.

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Usami, Y., Imokawa, K., Nohdomi, R. et al. Phase Changes of 4H-SiC in Excimer Laser Doping. J. Electron. Mater. 51, 3766–3772 (2022). https://doi.org/10.1007/s11664-022-09625-4

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