Post-deposition processing was conducted on ZnO thin films deposited by radio␣frequency (RF) magnetron sputtering. Rapid thermal annealing (RTA) and ion implantation followed by RTA gave increased conductivity and the latter increased Hall-effect mobility from 1.7 cm2 V−1 s−1 to 9.5 cm2 V−1 s−1 Metal–semiconductor–metal photodetectors (MSM-PDs) had a low dark current, a high ratio of photo to dark current, and a high responsivity of 2.1 A/W. Current transport mechanisms of MSM-PDs with post-annealing exhibited two primary space-charge-limited mechanisms, m > 2 and m < 1, following I ≈ V m. The non-annealed ZnO film gave one mechanism with m < 1 in photo I–V. Response to a femtosecond pulse gave rise and fall times in the range of 12 ns to 29 ns.
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Acknowledgement
The research was partially supported by the AFOSR, monitored by Dr. Kitt Reinhardt and a NASA Space Grant, as a subcontract from Cornell University.
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Yen, T., Haungs, A., Kim, S.J. et al. Effect of Post-Deposition Processing on ZnO Thin Films and Devices. J. Electron. Mater. 39, 568–572 (2010). https://doi.org/10.1007/s11664-009-0999-5
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DOI: https://doi.org/10.1007/s11664-009-0999-5