Abstract
High-temperature processing was applied to SiC boron-doped epitaxial layers, epitaxial layers grown on boron-rich substrates, and boron-implanted samples in order to establish conditions favorable for the formation of boron-related centers (D-centers) that introduce a deep level in SiC bandgap. Photoluminescence (PL) was used to detect and compare the formation of the D-center after different processing steps. It was confirmed that the presence of lattice defects was required for achieving significant boron diffusion and D-center formation. In addition, epitaxial growth on the top of a boron-implanted sample yielded efficient boron in-diffusion in the growing layer, which resulted in a material compensated with D-centers. The temperature dependence of the D-center formation efficiency was investigated.
Similar content being viewed by others
References
T. Anderson et al., Mater. Sci. Forum 9–12, 483 (2005).
T.A. Anderson, D.L. Barrett, J. Chen, E. Emorhokpor, A. Gupta, R.H. Hopkins, A.E. Souzis, C.D. Tanner, M. Yoganathan, and I. Zwieback, Mater Sci Forum 35–38, 483 (2005).
S.C. Binari, P.B. Klein, and T.E. Kazior, Proceedings of IEEE, 90, 1048 (2002).
Y. Koshka, M. Mazzola, S. Yingquan, and C.U. Pittman, Jr., J. Electron. Mater. 30, 220 (2001).
S. Ortolland, C. Raynaud, J.P. Chante, M.L. Locatelli, A.A. Lebedev, A.N. Andreev, N.S. Savkina, V.E. Chelnokov, M.G. Rastegaeva, and A.L. Syrkin, J. Appl. Phys. 80, 5464 (1996).
T. Troffer, M. Schadt, T. Frank, H. Itoh, G. Pensl, J. Heindl, H.P. Strunk, and M. Maier, Phys. Status Solidi (a) 162, 277 (1997).
Y. Koshka and I. Sankin, Mater. Sci. Forum 869, 483 (2005).
Y. Koshka and I. Sankin, unpublished research.
H. Bracht, N.A. Stolwijk, M. Laube, and G. Pensl, Appl. Phys. Lett. 77, 3188 (2000).
M. Laube, G. Pensl, and H. Itoh, Appl. Phys. Lett. 74, 2292 (1999).
M.S. Janson, M.K. Linnarsson, A. Hallen, B.G. Svensson, N. Nordell, and H. Bleichner, Appl. Phys. Lett. 76, 1434 (2000).
M. Gong, C.V. Reddy, C.D. Beling, S. Fung, G. Brauer, H. Wirth, and W. Skorupa, Appl. Phys. Lett. 72, 2739 (1998).
M.S. Mazzola, S.E. Saddow, and A. Schöner, Mater. Sci. Forum 119, 264 (1998).
S.G. Sridhara, L.L. Clemen, R.P. Devaty, W.J. Choyke, D.J. Larkin, H.S. Kong, T. Troffer, and G. Pensl, J. Appl. Phys. 83, 7909 (1998).
M.K. Linnarsson, M.S. Janson, A. Schoner, and B.G. Svensson, Mater. Res. Soc. Symp. Proc. 742, K6.1.1 (2003).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Das, H., Koshka, Y., Mazzola, M.S. et al. Effect of high-temperature processing on the creation of boron-related deep levels in 4H-SiC. J. Electron. Mater. 35, 625–629 (2006). https://doi.org/10.1007/s11664-006-0110-4
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/s11664-006-0110-4