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Effect of Cryogenic Temperature Deposition of Various Metal Contacts on Bulk Single-Crystal n-Type ZnO

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Abstract

The effect of cryogenic temperatures during metal deposition on the contact properties of Pd, Pt, Ti, and Ni on bulk single-crystal n-type ZnO has been investigated. Deposition at both room and low temperature produced contacts with Ohmic characteristics for Ti and Ni metallizations. By sharp contrast, both Pd and Pt contacts showed rectifying characteristics after deposition with barrier heights between 0.37 eV and 0.69 eV. Changes in contact behavior were measured on Pd to anneal temperatures of ∼300 °C, showing an increase in barrier height along with a decrease in ideality factor with increasing annealing temperature. This difference with annealing temperature is in sharp contrast to previous results for Au contacts to ZnO. There were no differences in near-surface stoichiometry for the different deposition temperatures; however, low temperature contacts demonstrated some peeling/cracking for Pt and Pd.

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Acknowledgements

The work at UF is partially supported by AFOSR Grant No. F49620-03-1-0370, by the Army Research Office under Grant No. DAAD19-01-1-0603, and the by the NSF (DMR 0400416, Dr. L. Hess).

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Authors and Affiliations

  1. Department of Materials Science and Engineering, University of Florida, Gainesville, FL, 32611, USA

    J.S. Wright, L. Stafford, B.P. Gila, D.P. Norton & S.J. Pearton

  2. Department of Chemical Engineering, University of Florida, Gainesville, FL, 32611, USA

    Hung-Ta Wang & F. Ren

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  1. J.S. Wright
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  2. L. Stafford
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  3. B.P. Gila
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  4. D.P. Norton
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Correspondence to J.S. Wright.

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Wright, J., Stafford, L., Gila, B. et al. Effect of Cryogenic Temperature Deposition of Various Metal Contacts on Bulk Single-Crystal n-Type ZnO. J. Electron. Mater. 36, 488–493 (2007). https://doi.org/10.1007/s11664-006-0039-7

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