Abstract
The interfacial microstructures of Sn-3.0Ag-0.5Cu (SAC305) solder systems with thin Ni(P) mono-coatings and Cu-Ni(P) dual-coatings were investigated after reflowing and isothermal aging. The ultrathin mono-Ni(P) plating of the SAC305/Ni(P) solder joint was found to rapidly decompose and then transform into a Ni2SnP phase. An intermetallic compound (IMC) formed at the plating/substrate interface, indicating that the ultrathin mono-Ni(P) plating was not an effective diffusion barrier. However, only a single IMC layer ((Cu,Ni)6Sn5) formed at the solder/plating interface in the SAC305/Cu/Ni(P)/Cu system. The (Cu,Ni)6Sn5 IMC effectively suppressed atomic diffusion, protecting the Ni(P) plating and Cu substrate. Although P-Sn-O pores formed in the root of the (Cu,Ni)6Sn5 IMC layer, the dual-Cu/Ni(P) plating protected the solder system for an extended period. The IMC growth rate constants of the SAC305/Cu, SAC305/Ni(P), and SAC305/Cu/Ni(P)/Cu solder joint systems were 0.180, 0.342, and 0.068 μm/h1/2, respectively. These results indicate that the application of dual-Cu/Ni(P) plating can effectively hinder the growth of IMC.
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J.W. Nah, J.H. Kim, H.M. Lee and K.W. Paik: Acta Mater., 2004, vol. 52, pp. 129-36.
Y. Ding, C.Q. Wang, Y.H. Tian, and B.B. Zhang: Metall. Mater. Trans. A., 2006, vol. 37, pp.1017-25.
V. Kumar, Z. Z. Fang, J. Liang and N. Dariavach: Metall. Mater. Trans. A., 2006, vol. 37, pp. 2505-14
X. Gu, K.C. Yung, Y.C. Chan and D. Yang: J. Mater. Sci. - Mater. Electron., 2011, vol. 22, pp. 217-22
DG Kim, JW Kim, SB Jung (2005) Mater. Sci. Eng. B 121:204-10.
S.R.A. Idris: Ph.D. Dissertation, University Teknologi Malaysia, 2008.
P. Sungkhaphaitoon and T. Plookphol: Metall. Mater. Trans. A, 2018, vol. 49, pp. 652-60.
A Sharif, MN Islam, YC Chan (2004) Mater. Sci. Eng. B 113:184-89.
HT Lee, MH Chen, HM Jao, TL Liao (2003) Mater. Sci. Eng. A 358:134-41.
L. Meinshausen: Ph.D. Dissertation, Electronics. University de Bordeaux, 2014.
J. Yu and K. Kim: Metall. Mater. Trans. A, 2015, vol. 46, pp. 3173-81.
S. Eraslan and M. Ürgen: Surf. Coat. Technol., 2015, vol. 265, pp. 46-52.
Katarzyna N., Braszczyńska-Malik and Jacek Kamieniak: Metall. Mater. Trans. A, 2017, vol. 48, pp. 5649-57.
T.R. Tamilarasan, R. Rajendran, G. Rajagopal and J. Sudagar: Surf. Coat. Technol., 2015, vol. 276, pp. 320-6.
Y.C. Lin and J.G. Duh: Scripta Mater., 2006, vol. 54, pp. 1661-5.
Y.C. Lin, T.Y. Shih, S.K. Tien and J.G. Duh: Scripta Mater., 2007, vol. 56, pp. 49-52.
Y.C. Lin, K.J. Wang and J.G. Duh: J. Electron. Mater., 2010, vol. 39, pp. 283-94.
S.P. Peng, W.H. Wu, C.E. Ho and Y.M. Huang: J. Alloys Compd., 2010, vol. 493, pp. 431-7.
W.H. Wu, C.S. Lin, S.H. Huang and C.E. Ho: J. Electron. Mater., 2010, vol. 39, pp. 2387-96.
C.E. Ho, C.W. Fan and W.Z. Hsieh: Surf. Coat. Technol., 2014, vol. 259, pp. 244-51.
C.Y. Ho, J.G. Duh, C.W. Lin, C.J. Lin and Y.H. Wu: J. Mater. Sci., 2013, vol. 48, pp. 2724-32.
C.Y. Liu and S.J. Wang: J. Electron. Mater., 2003, vol. 32, pp. 1303-9.
S.J. Wang and C.Y. Liu: Scripta Mater., 2003, vol. 49, pp. 813-8.
B Lee, H Jeon, KW Kwon, HJ Lee (2013) Acta Mater. 61: 6736-42.
J. Liang, N. Dariavach, P. Callahan and D. Shangguan: Mater. Trans., 2006, vol. 47, pp. 317-25.
P. Chen, X. Zhao, Y. Wang, Y. Liu, H. Li and Y. Gu: J. Mater. Sci. - Mater. Electron., 2015, vol. 26, pp. 1940-9.
X. Hu, T. Xu, L.M. Keer, Y. Li and X. Jiang: J. Alloys Compd., 2017, vol. 690, pp. 720-9.
M. Haerifar and M. Zandrahimi: Appl. Surf. Sci., 2013, vol. 284, pp. 126-32.
CW Liu, YL Wang, MS Tsai, HP Feng, SC Chang (2005) J. Vac. Sci. Technol. A 23:658-62.
Quéré D: Annu. Rev. Mater. Res., 2008, vol. 38, pp. 71-99.
W. Liu and D.P. Sekulic: Langmuir, 2011, vol. 27, pp. 6720-30.
J.W. Yoon and S.B. Jung: J. Mater. Sci., 2004, vol. 39, pp. 4211-7.
P.T. Vianco, J.A. Rejent and P.F. Hlava: J. Electron. Mater., 2004, vol. 33, pp. 991-1004.
J.Y. Park, C.W. Yang, J.S. Ha, C.U. Kim, E.J. Kwon, S.B. Jung and C.S. Kang: J. Electron. Mater., 2001, vol. 30, pp. 1165-70.
C.Y. Ho, J.G. Duh, C.W. Lin, C.J. Lin, Y.H. Wu, H.C. Hong and T.H. Wang: J. Mater.Sci., 2013, vol. 48, pp. 2724-32.
Y.C Lin, K.J. Wang and J.G. Duh: J .Electron. Mater., 2010, vol. 39, pp. 283-94.
C.Y. Ho, J.G. Duh: Mater. Chem. Phys., 2014, vol. 148, pp. 21-7.
V. Vuorinen, T. Laurila, H. Yu and J.K. Kivilahti: J. Appl. Phys., 2006, vol. 99, pp. 3530-36.
Z. Chen, A. Kumar and M. Mona: J. Electron. Mater., 2006, vol. 35, pp. 2126-34.
C.E. Ho, C.W. Fan, W.H. Wu and T.T. Kuo: Thin Solid Films, 2013, vol. 529, pp. 364-8.
W.M. Chen, S.C. Yang, M.H. Tsai and C.R. Kao: Scripta Mater., 2010, vol. 63, pp. 47-9.
K.N. Tu and K. Zeng: Mater. Sci. Eng. R, 2001, vol. 34, pp. 1-58..
W. Peng, E. Monlevade and M.E. Marques: Microelectron. Reliab., 2007, vol. 47, pp. 2161-8.
J. Shen, M. Zhao, P. He and Y. Pu: J. Alloys Compd., 2013, vol. 574, pp. 451-8.
D.G. Kim and S.B. Jung: J. Alloys Compd., 2005, vol. 386, pp. 151-6.
Acknowledgments
This study was supported by the Nature Science Foundation of China (No. 51465039, 51765040), and the Nature Science Foundation of Jiangxi Province (20161BAB206122).
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Manuscript submitted January 15, 2018.
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Zhang, Z., Hu, X., Jiang, X. et al. Influences of Mono-Ni(P) and Dual-Cu/Ni(P) Plating on the Interfacial Microstructure Evolution of Solder Joints. Metall Mater Trans A 50, 480–492 (2019). https://doi.org/10.1007/s11661-018-4983-7
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DOI: https://doi.org/10.1007/s11661-018-4983-7