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Effect of acetic acid on electrochemical deposition of carbon-nitride thin film

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Abstract

Electrochemical deposition method was employed to prepare CN x thin film from methanol-urea solution, and it was shown that adding a little acetic acid in the solution significantly affected the deposition process. After optimizing the experiment conditions, we obtained polycrystalline grains with sizes of about 3–7 μm on the faces of single crystal silicon. X-ray diffraction spectrua indicate that the grains are mainly composed of cubic phase mixed with a small amount of β and α phases.

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Authors and Affiliations

  1. Institute of Modern Physics, Fudan University, Shanghai, 200433, China

    Yu Tian, JianZhong Wang, WeiFeng Yu & XiJing Ning

  2. Applied Ion Beam Physics Laboratory, Key Laboratory of the Ministry of Education, Fudan University, Shanghai, 200433, China

    Yu Tian, JianZhong Wang, WeiFeng Yu & XiJing Ning

  3. Electronic Materials Laboratory, Department of Materials Science, Fudan University, Shanghai, 200433, China

    RongGen Cao & Yun Song

Authors
  1. Yu Tian
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  2. JianZhong Wang
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  3. WeiFeng Yu
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  4. RongGen Cao
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  5. Yun Song
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  6. XiJing Ning
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Correspondence to XiJing Ning.

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Supported by the National Natural Science Foundation of China (Grant No. 10574030)

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Tian, Y., Wang, J., Yu, W. et al. Effect of acetic acid on electrochemical deposition of carbon-nitride thin film. Sci. China Ser. E-Technol. Sci. 52, 1698–1702 (2009). https://doi.org/10.1007/s11431-009-0109-1

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  • DOI: https://doi.org/10.1007/s11431-009-0109-1

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