Photosynthetica 2006, 44(3):321-332 | DOI: 10.1007/s11099-006-0031-8

Ontogenetic approach to the assessment of plant resistance to prolonged stress using chlorophyll fluorescence induction method

T. V. Nesterenko1, A. A. Tikhomirov1, V. N. Shikhov1
1 Institute of Biophysics, Siberian Branch of the Russian Academy of Science, Akademgorodok, Krasnoyarsk, Russia

The review deals with objective reasons that limit the use of chlorophyll fluorescence induction kinetics (Chl FIK) method in plant ecology. Based on the ontogenetic approach (analysis and comparison of the dynamics of the Chl fluorescence ratio Fp/Fs and physiological characteristics of plant leaves in ontogeny) possible criteria for the estimation of general plant resistance of photosynthetic apparatus (PSA) to prolonged stress affects are proposed. One of these criteria is the presence or absence of a steady-state phase in the dynamics of Chl fluorescence ratio Fp/Fs (or Rfd) of plant leaves after they stop growing. We also propose to use the duration of the steady-state phase and variability of Chl fluorescence ratios Rfd and Fp/Fs in this period for quantitative assessment of plant PSA resistance to prolonged stress during plant leaf ontogeny.

Additional key words: leaf age; photosystems 1 and 2; radiation colour; specific leaf growth rate

Received: June 21, 2004; Accepted: February 17, 2006; Published: September 1, 2006  Show citation

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Nesterenko, T.V., Tikhomirov, A.A., & Shikhov, V.N. (2006). Ontogenetic approach to the assessment of plant resistance to prolonged stress using chlorophyll fluorescence induction method. Photosynthetica44(3), 321-332. doi: 10.1007/s11099-006-0031-8
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