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Highly bendable asymmetric resistive switching memory based on zinc oxide and magnetic iron oxide heterojunction

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Abstract

To block sneak current in a crossbar array, we propose asymmetric resistive switching device based on zinc oxide (ZnO) and magnetic iron oxide (Fe2O3) heterojunction, which has highly bendable performance with low power consumption. The ZnO/Fe2O3 heterojunction based active layer is fabricated on indium tin oxide (ITO). Polyethylene terephthalate (PET) substrate through spin coater and silver (Ag) is used as top electrode. Particularly, the active layer is protected by the magnetic force of Fe2O3 covered on ZnO, and hence, it can be bent under 1 mm diameter. The proposed memory is operated at low voltage of ± 1 V with reading voltage of ± 0.10204 V. In forward current, the fabricated device has high resistance state (HRS) of ~ 16.17 MΩ and low resistance state (LRS) of ~ 179.41 kΩ, respectively, at read voltage of + 0.10204 V, and Roff/Ron ratio is recorded as ~ 90.1. In reverse current, the HRS of ~ 15.69 MΩ and LRS of  ~ 9.23 MΩ are recorded at read voltage of − 0.10204 V, and Roff/Ron ratio is ~ 1.6976, which insure that the proposed asymmetric memory device helps to reduce sneak current problem.

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Acknowledgments

This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIP) (NRF-2016R1A2B4015627).

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  1. Muhammad Umair Khan and Gul Hassan are considered as the first contributing authors of this manuscript.

Authors and Affiliations

  1. Department of Ocean System Engineering, Jeju National University, 102 Jejudaehakro, Jeju, 63243, Republic of Korea

    Muhammad Umair Khan, Gul Hassan & Jinho Bae

  2. Centre for Advanced Electronics & Photovoltaic Engineering (CAEPE), International Islamic University, H-10, Islamabad, 44000, Pakistan

    Gul Hassan

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  1. Muhammad Umair Khan
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Correspondence to Jinho Bae.

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Khan, M.U., Hassan, G. & Bae, J. Highly bendable asymmetric resistive switching memory based on zinc oxide and magnetic iron oxide heterojunction. J Mater Sci: Mater Electron 31, 1105–1115 (2020). https://doi.org/10.1007/s10854-019-02622-0

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