Abstract
In order to obtain the reaction mechanism and thermodynamic parameters on tin oxide surface chemistry, which provide theoretical data for atomic layer deposition equipment optimization. The reaction mechanism of preparation of SnO2 pathway for TDMASn and H2O half reaction by atomic layer deposition (ALD) was studied by Density Function Theory. The study employed the average local ion energy (ALIE) and electrostatic potential (ESP) to predict potential reaction sites. These reaction sites were identified by investigating the ALIE extremes and the distribution of ESP intervals between the reactants. The results revealed that the primary reaction sites resided between the nitrogen (N) atoms within three distinct dimethylamino moieties and the outer region of tin (Sn) atoms. Transition state calculations were subsequently performed to ascertain the activation energies of the reaction steps, which resulted in TS1 (11.75 kcal mol−1), TS2 (7.16 kcal mol−1), TS3 (6.49 kcal mol−1), and TS4 (5.76 kcal mol−1). The interaction region indicator analysis was employed to verify the reaction mechanism, and the breakage and reformation of chemical bonds during the reaction were analyzed. The reaction rate constant (k) was calculated by the transition state theory. The Wigner tunneling factor also was used for correction to determine the reaction rate constants at both the standard temperature (298.15 K) and the reaction temperature (413.15 K). Meanwhile, the thermodynamic parameters of each reactant and product were calculated. These parameters can provide theoretical data to computational fluid dynamics model for the design and optimization of equipment for the preparation of SnO2 thin film using ALD.
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Acknowledgements
This work was supported by National Key Research and Development Program of China (No. 2022YFB3404401) and National Natural Science Foundation of China (No. 51975594). This work was supported in part by the High Performance Computing Center of Central South University.
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PW contributed to investigation, modeling calculation, and writing of the original draft. YW was involved in the investigation and conceptualization. TW and JX contributed to analysis and revision. WX and YP were involved in the resources and analysis. JL contributed to revision, resources, and project administration.
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Wang, P., Wu, Y., Wu, T. et al. Theoretical study on tin oxide surface chemistry mechanism and thermodynamic properties for atomic layer deposition equipment optimization. J Mater Sci 58, 15634–15646 (2023). https://doi.org/10.1007/s10853-023-09007-z
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DOI: https://doi.org/10.1007/s10853-023-09007-z