Abstract
Owing to the development of high temperature applications using SiC, this study examines the effect of TiN coatings against Si and C atoms diffusion in presence of two refractory metals (W or Mo). Indeed, SiC reacts rapidly with these metals at elevated temperatures generating unacceptable reaction zones and a mechanical embrittlement. Samples used during this work were prepared on wire and planar metallic substrates, SiC and TiN being deposited by CVD. The effect given by TiN interlayers with thicknesses between 10 and 20 μm was considered at 1773 K. From our results, TiN can be considered as an effective diffusion barrier in presence of W, whereas it ensures no real protection in the case of Mo-containing samples.
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Roger J, Audubert F, Le Petitcorps Y (2008) J Mater Sci 43:3938. doi:10.1007/s10853-007-2334-y
Roger J, Audubert F, Le Petitcorps Y (2009) J Alloys Compd 475:635
Geib KM, Wilson C, Long RG, Wilmsen CW (1990) J Appl Phys 68(6):2796
Tang WM, Zheng ZX, Ding HF, Jin ZH (2003) Mater Chem Phys 80:360
Bhanumurthy K, Schmid-Fetzer R (2001) Composites 32A:569
Chou TC, Joshi A, Wadsworth J (1991) J Mater Res 6(4):796
van Loo FJJ, Smet FM, Rieck GD, Verspui G (1982) High Temp High Press 14:25
Brewer L, Krikorian O (1956) J Electrochem Soc 103:38
Baud L, Jaussaud C, Madar R, Bernard C, Chen JS, Nicolet MA (1995) Mater Sci Eng B29:126
Heijnen LM, Kuijpers TW, Klostermann AA (1988) High Temp High Press 20(3):305
Bouslah S, Mansouri N, Zaamouche A (2005) Phys Chem News 25:58
Rudy E (1973) J Less Common Met 33:245
Roger J, Audubert F, Le Petitcorps Y (2009) Adv Eng Mater 11(5):399
Van Loo FJJ, Wakelkamp W, Bastin GF, Metselaar R (1989) Solid State Ionics 32/33:824
Andrieux M, Ducarroir M, Beauprez E (1998) Thin Solid Films 324:141
Rebouta L, Tavares CJ, Aimo R, Wang Z, Pischow K, Alves E, Rojas TC, Odriozola JA (2000) Surf Coat Technol 131–134:234
Kong M, Dai J, Lao J, Li G (2007) Appl Surf Sci 253:4734
Kuo Y-L, Lee C, Lin J-C, Yen Y-W, Lee W-H (2005) Thin Solid Films 484:265
Ma X, Li C, Zhang W (2005) J Alloys Compd 394:138
Govindarajan S, Moore JJ, Ohno TR, Disam J (1997) Surf Coat Technol 94–95:7
Govindarajan S, Moore JJ, Disam J, Suryanarayana C (1999) Met Mater Trans 30A:799
Kuo D-H, Huang K-W (2001) Surf Coat Technol 135:150
Staia MH, Puchi ES, Lewis DB, Cawley J, Morel D (1996) Surf Coat Technol 86–87:432
Figueras A, Garelik S, Santiso J, Rodriguez-Clemente R, Armas B, Combescure C, Berjoan R, Saurel JM, Caplain R (1992) Mater Sci Eng B11:83
Henry F, Armas B, Combescure C, Figueras A, Garelik S (1996) Surf Coat Technol 80:134
Veintemillas S, Madigou V, Rodriguez-Clemente R, Figueras A (1995) J Cryst Growth 148:383
Madigou V, Veintemillas S, Rodriguez-Clemente R, Figueras A, Armas B, Combescure C (1995) J Cryst Growth 148:390
Srikanth Vadali VSS, Samra HA, Staedler T, Jiang X (2007) Surf Coat Technol 201:8981
Binder S, Lengauer W, Ettmayer P, Bauer J, Debuigne J, Bohn M (1995) J Alloys Compd 217:128
Roger J, Audubert F, Le Petitcorps Y (2010) J Alloys Compd (accepted, ref: JALCOM-D-09-03643)
Lan FT, Li KZ, Li HJ, He YG, Shen XT, Cao WF (2009) J Mater Sci 44:3747. doi:10.1007/s10853-00903501-0
Chatilyan HA, Kharatyan SL, Harutyunyan AB (2007) Mater Sci Eng A459:227
Barabash OM, Shurin AK (1978) Russ Met 4:180
Acknowledgement
The authors wish to thank M. Lahaye (CeCaMA, Bordeaux) for his assistance in SEM and EPMA studies.
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Roger, J., Audubert, F. & Le Petitcorps, Y. Reactivity of M/TiN/SiC systems (M = W and Mo) at high temperature. J Mater Sci 45, 3073–3079 (2010). https://doi.org/10.1007/s10853-010-4314-x
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DOI: https://doi.org/10.1007/s10853-010-4314-x