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A Room Temperature Two-Step Electrochemical Process for Large Area Nanocrystalline Ferrite Thin Films Deposition

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Abstract

In this paper, we present a room temperature two-step electrochemical process for the deposition of large area (∼10 cm2) nanocrystalline ferrite thin films. As an example, the optimized conditions for the deposition of copper, nickel and cobalt ferrites on different conducting substrates and their physical properties are reviewed. The films are spinel in crystal structure and well adherent to the substrates. The electrical and magnetic properties of the films after annealing are comparable to the properties obtained with the films formed with other physical and chemical techniques.

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Author notes

  1. S. D. Sartale

    Present address: Thin Film Physics Laboratory, Department of Physics, Shivaji University, Kolhapur, 413 003, India

Authors and Affiliations

  1. Department of Physics, National Central University, Jungda Road 300, Jungli, Taiwan, 32054

    S. D. Sartale & C. D. Lokhande

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  1. S. D. Sartale
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  2. C. D. Lokhande
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Correspondence to S. D. Sartale.

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Sartale, S.D., Lokhande, C.D. A Room Temperature Two-Step Electrochemical Process for Large Area Nanocrystalline Ferrite Thin Films Deposition. J Electroceram 15, 35–44 (2005). https://doi.org/10.1007/s10832-005-1076-y

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  • DOI: https://doi.org/10.1007/s10832-005-1076-y

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