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Characterization of reactive magnetron sputtered nanocrystalline titanium nitride (TiN) thin films with brush plated Ni interlayer

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Abstract

Thin nanocrystalline Titanium nitride (TiN) films were deposited on mild steel (MS) substrates using reactive direct current magnetron sputtering. With the aim of improving the corrosion resistance an additional Nickel interlayer of about 5 μm thick was brush plated on to the steel substrates. X-ray diffraction analysis showed the polycrystalline nature of the sputtered TiN films. SEM analysis showed uniform surface morphology with dense columnar structure. Laser Raman spectroscopy revealed the presence of characteristic peaks of TiN at 320, 440 and 570 cm−1. The optical quality of the film was confirmed from the photoluminescence (PL) spectrum recorded at room temperature. The corrosion behavior of the coatings in 3.5% NaCl solution was studied using electrochemical techniques.

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Acknowledgements

One of the authors (B.S) thanks the Department of Science &Technology, New Delhi, for a research grant under SERC Fast Track scheme No SR/FTP/CS-23/2005.

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Authors and Affiliations

  1. ECMS Division, Central Electrochemical Research Institute, Karaikudi, 630006, India

    B. Subramanian & M. Jayachandran

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  1. B. Subramanian
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  2. M. Jayachandran
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Correspondence to B. Subramanian.

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Subramanian, B., Jayachandran, M. Characterization of reactive magnetron sputtered nanocrystalline titanium nitride (TiN) thin films with brush plated Ni interlayer. J Appl Electrochem 37, 1069–1075 (2007). https://doi.org/10.1007/s10800-007-9357-6

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  • DOI: https://doi.org/10.1007/s10800-007-9357-6

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