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Analytical modeling of read noise margin of a CNFET based 6T SRAM cell

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Abstract

There is a pressing need to increase the levels of on-chip integration of SRAM, which offers serious design challenges in terms of power requirement and cell stability. Static noise margin is an important criterion to constitute SRAM stability. As the CMOS technology is facing numerous challenges due to feature size reductions, carbon nanotube field effect transistors (CNFET) has been recommended for high stability, high performance and low power SRAM cell design. In this paper the stability of CNFET based 6T SRAM cells is investigated analytically as well as by simulation. We have derived an explicit analytical expression for the read static noise margin as a function of device parameters. The SRAM is also simulated in HSPICE and the results are in good agreement with the result obtained from the analytic expression. Along with other parameters supply voltage is also considered as a variable in the analytic expression to observe its effect on the read static noise margin.

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References

  1. Wang, W., Yu, Z., & Choi, K. (2011). High SNM CNFET SRAM Cell Design Considering Nanotube Diameter and Transistor Ratio (pp. 1–4). IEEE Int. Conf. on Electro/Information Technology: Mnakato, MN, May.

    Google Scholar 

  2. Sheng Lin, Yong-Bin Kim and Fabrizio Lombardi, “A New SRAM Cell Design Using CNTFETs,” International SoC Design Conference, 2008. Volume 01, Page(s): I-168 - I-171, Nov. 2008.

  3. Wei Wang, and Ken Choi, “Novel curve fitting design method for carbon nanotube SRAM cell optimization,” IEEE International Conference on Electro/Information Technology (EIT), May 2010.

  4. Moradinasab M., Karbassian F., and Fathipour M., “A comparison study of the effects of supply voltage and temperature on the stability and performance of CNFET and nanoscale Si-MOSFET SRAMs,” Asia Symposium on Quality Electronic Design, Page(s):19 – 23.A, 15-16 July 2009.

  5. Kuresh, A. K., & Hasan, M. (2009). Performance comparison of CNFET- and CMOS-based 6T SRAM cell in deep submicron. Microelectronics Journal Archive, 40(6), 979–982.

    Article  Google Scholar 

  6. Moradinasab, M., & Fathipour, M. (2009). Stable, low power and high performance SRAM based on CNFET. In 10th International Conference on Ultimate Integration of Silicon (ULIS 2009). (pp. 317–320).

  7. Shahidipour, H., Zhong, Y., Ahmadi, A., & Maharatna, K. (2010). Effects of CNT diameter variability on a CNTFET-based SRAM. In Proceedings of IEEE APCCAS, Quala Lumpur (pp. 971–974).

  8. Pable, S.D., Kureshi, A.K., Kafeel M.A., & Hasan M. (2011). Performance analysis of SRAM cell for ultralow energy applications. In International Conference on Multimedia, Signal Processing and Communication Technologies (IMPACT, 2011) (pp. 12–15).

  9. Seevinck, E, Sr, List, F. J., & Lohstroh, J. (1987). Static-noise margin analysis of MOS SRAM cells. IEEE Journal of Solid-State Circuits, 22, 748–754.

    Article  Google Scholar 

  10. Lohstroh, J. (1979). Static and dynamic noise margins of logic circuits. IEEE Journal of Solid-State Circuits, 14(3), 591–598.

    Article  Google Scholar 

  11. Lohstroh, J., Seevinck, E., & Groot, J. D. (1983). Worst-case static noise margin for logic circuits and their mathematical equivalence. IEEE Journal of Solid-State Circuits, 18, 803–807.

    Article  Google Scholar 

  12. Wong, H. S. P. (2002). Field effect transistors—from silicon MOSFETs to carbon nanotube FETs. In Proceedings of 23th International Conference on Microelectronics, (MIEL), (vol. 1, pp.103–107).

  13. Javey, R., Tu, D. B., Farmer, J., Guo, R., Gordon, G., & Dai, H. (2005). High performance ntype carbon nanotube field-effect transistors with chemically doped contacts. NanoLetters, 5, 345–348.

    Article  Google Scholar 

  14. Nihey, F., Hongo, H., Ochiai, Y., Yudasaka, M., & Iijima, S. (2003). Carbon-nanotube field effect transistors with very high intrinsic transconductance. Japanese Journal of Applied Physics, 42, L1288–L1291.

    Article  Google Scholar 

  15. Wind, S. J., Appenzeller, J., Martel, R., Derycke, V., & Avouris, P. (2002). Fabrication and electrical characterization of top gate single-wall CNFETs. Journal of Vacuum Science and Technology B, 20, 2798–2801.

    Article  Google Scholar 

  16. Martel, R., Schmidt, T., Shea, H. R., Hertel, T., & Avouris, P. (1998). Single and multi wall carbon nanotube field effect transistors. Applied Physics Letters, 73, 2447–2449.

    Article  Google Scholar 

  17. Wang, M. C. (2009). Low power dual word line 6-transistor SRAMs. Princeton University, San Francisco, USA. In Proceedings of the World Congress on Engineering and Computer Science WCECS 2009 (Vol. I, pp. 20–22).

  18. Pushkarna, A., Raghavan, S., & Mahmoodi, H. (2010). Comparison of performance parameters of SRAM designs in 16 nm CMOS and CNFET technologies. School of Engineering, San Francisco State University, San Francisco, USA.

  19. Saha, D., Saha, P., Naskar, K., Jain, A., & Sarkar S. K. (2013). Comparative study & analysis of 32 nm FDSOI/SON and CNFET based 4 × 4 SRAM cell array, ICCPCT-2013. (pp. 929–934).

  20. Arandilla, C. D., Anastacia, A. B., & Roque C. R. K. (2011). Static noise margin of 6T SRAM cell in 90-nm CMOS. Electrical and Electronics Engineering Institute University of the Philippines—Diliman Quezon City, Philippines, In UKSim 13th International Conference on Modelling and Simulation.

  21. Marulanda, J. M., Srivastava, A., and Yellampalli, S. (2008). Numerical modeling of the IV characteristic of carbon nanotube field effect transistors (CNT-FETs), New Orleans. In Proceedings of IEEE 40th Southeastern Symposium on System Theory (SSST 2008), (pp. 235–238)

  22. Deng, J., & Wong, H.-S. P. (2007). A compact spice model for carbon-nanotube field-effect transistors including nonidealities and its application—Part I: Model of the intrinsic channel region. IEEE Transactions on Electron Devices, 54, 3186–3194.

    Article  Google Scholar 

  23. McEuen, P. L., Fuhrer, M. S., & Park, H. (2002). Singlewalled carbon nanotube electronics. IEEE Transactions on Nanotechnology, 1, 78–85.

    Article  Google Scholar 

  24. Morifuji, E., Yoshida, T., Tsuno, H., Kikuchi, Y., Matsuda, S., Yamada, S., Noguchi, T., & Kakumu, M. (2004). New guideline of Vdd and Vth scaling for 65 nm technology and beyond. In Digest of Technical Papers, 2014 Symposium on VLSI Technology, (pp. 164–165).

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Correspondence to Priyanka Saha.

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Saha, P., Jain, A. & Sarkar, S.K. Analytical modeling of read noise margin of a CNFET based 6T SRAM cell. Analog Integr Circ Sig Process 83, 369–376 (2015). https://doi.org/10.1007/s10470-015-0523-1

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